Plasma sterilization in low-pressure RF discharge

The present paper clarifies the conditions under which the process of plasma sterilization of medical tools may be efficiently performed in the RF capacitive gas discharge of low pressure in air. Experiments were performed with a number of gram-positive and gram-negative bacteria as well as with fun...

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Дата:2000
Автори: Lisovskiy, V.A., Yakovin, S.D., Yegorenkov, V.D., Terent’eva, A.G.
Формат: Стаття
Мова:English
Опубліковано: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2000
Назва видання:Вопросы атомной науки и техники
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Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/81613
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Plasma sterilization in low-pressure RF discharge / V.A. Lisovskiy, S.D. Yakovin, V.D. Yegorenkov, A.G. Terent’eva // Вопросы атомной науки и техники. — 2000. — № 1. — С. 77-81. — Бібліогр.: 14 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id irk-123456789-81613
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spelling irk-123456789-816132015-05-19T03:02:24Z Plasma sterilization in low-pressure RF discharge Lisovskiy, V.A. Yakovin, S.D. Yegorenkov, V.D. Terent’eva, A.G. Газовый рaзряд, ППР и их применения The present paper clarifies the conditions under which the process of plasma sterilization of medical tools may be efficiently performed in the RF capacitive gas discharge of low pressure in air. Experiments were performed with a number of gram-positive and gram-negative bacteria as well as with fungi. The process of sterilization in the RF discharge is shown to possess a threshold pattern. Probably the bombardment of bacteria with positive ions and hot molecules of the neutral gas is the main sterilizing factor in the low pressure RF discharge, and the UV radiation of plasma plays the auxiliary role. 2000 Article Plasma sterilization in low-pressure RF discharge / V.A. Lisovskiy, S.D. Yakovin, V.D. Yegorenkov, A.G. Terent’eva // Вопросы атомной науки и техники. — 2000. — № 1. — С. 77-81. — Бібліогр.: 14 назв. — англ. 1562-6016 http://dspace.nbuv.gov.ua/handle/123456789/81613 533.9 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
topic Газовый рaзряд, ППР и их применения
Газовый рaзряд, ППР и их применения
spellingShingle Газовый рaзряд, ППР и их применения
Газовый рaзряд, ППР и их применения
Lisovskiy, V.A.
Yakovin, S.D.
Yegorenkov, V.D.
Terent’eva, A.G.
Plasma sterilization in low-pressure RF discharge
Вопросы атомной науки и техники
description The present paper clarifies the conditions under which the process of plasma sterilization of medical tools may be efficiently performed in the RF capacitive gas discharge of low pressure in air. Experiments were performed with a number of gram-positive and gram-negative bacteria as well as with fungi. The process of sterilization in the RF discharge is shown to possess a threshold pattern. Probably the bombardment of bacteria with positive ions and hot molecules of the neutral gas is the main sterilizing factor in the low pressure RF discharge, and the UV radiation of plasma plays the auxiliary role.
format Article
author Lisovskiy, V.A.
Yakovin, S.D.
Yegorenkov, V.D.
Terent’eva, A.G.
author_facet Lisovskiy, V.A.
Yakovin, S.D.
Yegorenkov, V.D.
Terent’eva, A.G.
author_sort Lisovskiy, V.A.
title Plasma sterilization in low-pressure RF discharge
title_short Plasma sterilization in low-pressure RF discharge
title_full Plasma sterilization in low-pressure RF discharge
title_fullStr Plasma sterilization in low-pressure RF discharge
title_full_unstemmed Plasma sterilization in low-pressure RF discharge
title_sort plasma sterilization in low-pressure rf discharge
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
publishDate 2000
topic_facet Газовый рaзряд, ППР и их применения
url http://dspace.nbuv.gov.ua/handle/123456789/81613
citation_txt Plasma sterilization in low-pressure RF discharge / V.A. Lisovskiy, S.D. Yakovin, V.D. Yegorenkov, A.G. Terent’eva // Вопросы атомной науки и техники. — 2000. — № 1. — С. 77-81. — Бібліогр.: 14 назв. — англ.
series Вопросы атомной науки и техники
work_keys_str_mv AT lisovskiyva plasmasterilizationinlowpressurerfdischarge
AT yakovinsd plasmasterilizationinlowpressurerfdischarge
AT yegorenkovvd plasmasterilizationinlowpressurerfdischarge
AT terentevaag plasmasterilizationinlowpressurerfdischarge
first_indexed 2023-10-18T19:23:35Z
last_indexed 2023-10-18T19:23:35Z
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