Magnetron with a concave hemispherical cathode
A magnetron set up with a hemispherical concave cathode has been worked out for the first time. The cathode center of curvature was registered with the sputtered surface. An aluminum nitride film was sputtered by this magnetron in the pulse regime. The pulse duration was about 2 ms. The film thick...
Збережено в:
| Дата: | 2009 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2009
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/88319 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Magnetron with a concave hemispherical cathode / B.V. Stetsenko, A.I. Shchurenko, Yu.G. Zavyalov // Вопросы атомной науки и техники. — 2009. — № 1. — С. 134-135. — Бібліогр.: 8 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | A magnetron set up with a hemispherical concave cathode has been worked out for the first time. The cathode
center of curvature was registered with the sputtered surface. An aluminum nitride film was sputtered by this magnetron
in the pulse regime. The pulse duration was about 2 ms. The film thickness was between 10 to 12 nm. The sputtering
rate was about 50 nm/s. The magnetron characteristics agree with a qualitative model of the magnetron. |
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