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Synthesis of Ti-Si and Ti-Si-N coatings by condensation of filtered vacuum-arc plasma
Synthesis of Ti-Si and Ti-Si-N coatings using a filtered vacuum-arc plasma source with consumable titaniumsilicon cathode was investigated. The thickness of films and their elemental composition were defined by means of the X-ray fluorescent analysis. It has been established, that the silicon conc...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2009
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/90791 |
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| Summary: | Synthesis of Ti-Si and Ti-Si-N coatings using a filtered vacuum-arc plasma source with consumable titaniumsilicon
cathode was investigated. The thickness of films and their elemental composition were defined by means of
the X-ray fluorescent analysis. It has been established, that the silicon concentration in coating can be changed over
a wide range, from zero to the maximum value defined by silicon content in the cathode, by adjustment deposition
process parameters – working gas pressure, substrate negative bias voltage, magnetic field intensity and its spatial
distribution. |
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