Розроблення математичної моделі хвильових процесів у багатошарових структурах із адаптивним алгоритмом та гібридними обчисленнями
The paper investigates the numerical simulation of wave processes in multilayer thin films, which is relevant for understanding their physical properties and optimization for various applications. An integrated mathematical model has been developed that combines Maxwell’s equations, mechanical vibra...
Saved in:
| Date: | 2026 |
|---|---|
| Main Author: | |
| Format: | Article |
| Language: | English |
| Published: |
The National Technical University of Ukraine "Igor Sikorsky Kyiv Polytechnic Institute"
2026
|
| Subjects: | |
| Online Access: | https://journal.iasa.kpi.ua/article/view/365255 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | System research and information technologies |
| Download file: | |
Institution
System research and information technologies| Summary: | The paper investigates the numerical simulation of wave processes in multilayer thin films, which is relevant for understanding their physical properties and optimization for various applications. An integrated mathematical model has been developed that combines Maxwell’s equations, mechanical vibrations and thermal conductivity, taking into account the interaction of physical fields in structures with defects. Adaptive algorithms have been proposed for automatic mesh refinement depending on local gradients of physical parameters, which allows to increase the accuracy of modeling in critical zones. A hybrid approach to calculations using CPU and GPU has been implemented, which ensures efficient use of resources for large-scale problems. Software with a modular architecture has been developed that allows integrating numerical methods, optimization and visualization of results in real time. Experimental validation has confirmed the high accuracy and reliability of the model. The results obtained contribute to a deeper understanding of physical processes in thin films and are the basis for the creation of highly efficient multilayer structures in industrial and scientific applications. |
|---|---|
| DOI: | 10.20535/SRIT.2308-8893.2026.2.04 |