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Comparison of physicochemical properties of nitride films produced by various reactive sputtering methods

Improvement of physical, mechanical and chemical properties of thin nitride films depends on the methods of their deposition and improvement of the structure, which determines the obtained properties. In the production of nitride films, which are promising in solid-state microelectronics and instrum...

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Datum:	2014
Hauptverfasser:	Василенко, Наталья Афанасьевна, Василенко, Алексей Олегович
Format:	Artikel
Sprache:	Russisch
Veröffentlicht:	Інститут енергетичних машин і систем ім. А. М. Підгорного Національної академії наук України 2014
Schlagworte:	ion implantation condensation and ion bombardment nitride physicochemical properties УДК 535.338.43.533.59
Online Zugang:	https://journals.uran.ua/jme/article/view/19925
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Journal of Mechanical Engineering

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Journal of Mechanical Engineering

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