Ion implantation, ion-beam mixing during simultaneous ion implantation and metal deposition

• Published in: Физическая инженерия поверхности
• Date: 2013
• Main Authors: Lisovenko, M.A., Belovol, K.O., Kyrychenko, O.V., Shablya, V.T., Kassi, J., Gritsenko, B.P., Burkovska, V.V.
• Format: Article
• Language: English
• Published: Науковий фізико-технологічний центр МОН та НАН України 2013
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/100596
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Ion implantation, ion-beam mixing during simultaneous ion implantation and metal deposition / M.A. Lisovenko, K.O. Belovol, O.V. Kyrychenko, V.T. Shablya, J. Kassi, B.P. Gritsenko, V.V. Burkovska // Физическая инженерия поверхности. — 2013. — Т. 11, № 4. — С. 406–411. — Бібліогр.: 6 назв. — англ.

This article present‘s researching results of ion implantation Ta in Cu monocrystal with different plane.
 Also the article demonstrates the processes of ion mixing and deposition of ions Ta+ and Cu+ on
 polycrystalline Al substrate. Effect of crystalline plane line was found. At the...