Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions
It was shown that a light source with edge sharpness can be used for very sensitive measurements of the ratio of specular and diffusive components of reflectance of the mirror subjected to sputtering. Измерение изображения резко очерченного источника света, отраженного от зеркала (IQ-метод), являетс...
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| Опубліковано в: : | Вопросы атомной науки и техники |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2012
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| Цитувати: | Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions / V.G. Konovalov, V.N. Bondarenko, I.V. Ryzhkov, A.N. Shapoval, A.F. Shtan’, O.O. Skoryk, S.I. Solodovchenko, V.S. Voitsenya // Вопросы атомной науки и техники. — 2012. — № 6. — С. 114-116. — Бібліогр.: 3 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
nasplib_isofts_kiev_ua-123456789-109144 |
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Konovalov, V.G. Bondarenko, V.N. Ryzhkov, I.V. Shapoval, A.N. Shtan’, A.F. Skoryk, O.O. Solodovchenko, S.I. Voitsenya, V.S. 2016-11-20T21:41:01Z 2016-11-20T21:41:01Z 2012 Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions / V.G. Konovalov, V.N. Bondarenko, I.V. Ryzhkov, A.N. Shapoval, A.F. Shtan’, O.O. Skoryk, S.I. Solodovchenko, V.S. Voitsenya // Вопросы атомной науки и техники. — 2012. — № 6. — С. 114-116. — Бібліогр.: 3 назв. — англ. 1562-6016 PACS: 78.20.Ci; 79.20.Rf; 81.40.Tv https://nasplib.isofts.kiev.ua/handle/123456789/109144 It was shown that a light source with edge sharpness can be used for very sensitive measurements of the ratio of specular and diffusive components of reflectance of the mirror subjected to sputtering. Измерение изображения резко очерченного источника света, отраженного от зеркала (IQ-метод), является очень чувствительным методом регистрации соотношения зеркального и диффузного компонентов коэффициента отражения при распылении испытуемых образцов. Вимірювання зображення різко окресленого джерела світла, відбитого від дзеркала (IQ-метод), є дуже чутливим методом реєстрації співвідношення дзеркального та дифузного компонентів коефіцієнта відбиття при розпиленні випробовуваних зразків. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Динамика плазмы и взаимодействие плазмы со стенкой Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions Измерение зеркального и диффузного компонентов коэффициента отражения при распылении стальных зеркал ионами Ar⁺ Вимірювання дзеркального та дифузного компонентів коефіцієнта відбиття при розпиленні сталевих дзеркал іонами Ar⁺ Article published earlier |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| title |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions |
| spellingShingle |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions Konovalov, V.G. Bondarenko, V.N. Ryzhkov, I.V. Shapoval, A.N. Shtan’, A.F. Skoryk, O.O. Solodovchenko, S.I. Voitsenya, V.S. Динамика плазмы и взаимодействие плазмы со стенкой |
| title_short |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions |
| title_full |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions |
| title_fullStr |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions |
| title_full_unstemmed |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions |
| title_sort |
specular and diffusive reflectance of stainless steel mirrors sputtered with ar⁺ ions |
| author |
Konovalov, V.G. Bondarenko, V.N. Ryzhkov, I.V. Shapoval, A.N. Shtan’, A.F. Skoryk, O.O. Solodovchenko, S.I. Voitsenya, V.S. |
| author_facet |
Konovalov, V.G. Bondarenko, V.N. Ryzhkov, I.V. Shapoval, A.N. Shtan’, A.F. Skoryk, O.O. Solodovchenko, S.I. Voitsenya, V.S. |
| topic |
Динамика плазмы и взаимодействие плазмы со стенкой |
| topic_facet |
Динамика плазмы и взаимодействие плазмы со стенкой |
| publishDate |
2012 |
| language |
English |
| container_title |
Вопросы атомной науки и техники |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| format |
Article |
| title_alt |
Измерение зеркального и диффузного компонентов коэффициента отражения при распылении стальных зеркал ионами Ar⁺ Вимірювання дзеркального та дифузного компонентів коефіцієнта відбиття при розпиленні сталевих дзеркал іонами Ar⁺ |
| description |
It was shown that a light source with edge sharpness can be used for very sensitive measurements of the ratio of specular and diffusive components of reflectance of the mirror subjected to sputtering.
Измерение изображения резко очерченного источника света, отраженного от зеркала (IQ-метод), является очень чувствительным методом регистрации соотношения зеркального и диффузного компонентов коэффициента отражения при распылении испытуемых образцов.
Вимірювання зображення різко окресленого джерела світла, відбитого від дзеркала (IQ-метод), є дуже чутливим методом реєстрації співвідношення дзеркального та дифузного компонентів коефіцієнта відбиття при розпиленні випробовуваних зразків.
|
| issn |
1562-6016 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/109144 |
| citation_txt |
Specular and diffusive reflectance of stainless steel mirrors sputtered with Ar⁺ ions / V.G. Konovalov, V.N. Bondarenko, I.V. Ryzhkov, A.N. Shapoval, A.F. Shtan’, O.O. Skoryk, S.I. Solodovchenko, V.S. Voitsenya // Вопросы атомной науки и техники. — 2012. — № 6. — С. 114-116. — Бібліогр.: 3 назв. — англ. |
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114 ISSN 1562-6016. ВАНТ. 2012. №6(82)
SPECULAR AND DIFFUSIVE REFLECTANCE OF STAINLESS STEEL
MIRRORS SPUTTERED WITH Ar+ IONS
V.G. Konovalov, V.N. Bondarenko, I.V. Ryzhkov, A.N. Shapoval, A.F. Shtan’, O.O. Skoryk,
S.I. Solodovchenko, V.S. Voitsenya
Institute of Plasma Physics NSC “Kharkov Institute of Physics and Technology”,
Kharkov, Ukraine
E-mail: konovalov@ipp.kharkov.ua
It was shown that a light source with edge sharpness can be used for very sensitive measurements of the ratio of
specular and diffusive components of reflectance of the mirror subjected to sputtering.
PACS: 78.20.Ci; 79.20.Rf; 81.40.Tv
INTRODUCTION
When sputtering a polycrystalline mirror, its initial
smooth surface turns into the surface with a step
structure. This transformation takes place due to the
dependence of sputtering coefficient of every metal
grain on the orientation of its main crystallographic axes
relatively to the mirror surface, and the orientation of
adjoining grains is, as a rule, different. Due to
development of a step structure relief during sputtering,
the degradation of mirror optical properties occurs.
Previously such effect was observed for reflectance at
normal incidence when stainless steel (SS) mirrors were
sputtered with deuterium plasma ions of different
energy [1].
The present work is devoted to investigation of the
dynamics of reflective properties of stainless steel
(analog of SS316 steel) mirrors subjected to
bombardment with Ar plasma ions of fixed energies:
300, 600 and 1000 eV. Measurements of reflectance
were provided by: (i) our traditional method using the
Tolansky scheme [2] (normal incidence of light) in the
wavelength range λ=220…650 nm [1], and (ii) the new,
suggested in our group recently, the method with
registration of an image of a light source with edge
sharpness (λ=500 nm) after reflection (at an angle 45°)
from the mirror under the test. The second method
(image quality method, IQ) gives possibility to make a
clear separation among specular (SR) and diffusive
(DR) components of reflectance. The state of the mirror
surface was controlled by the use of optical and
interferometer microscopes, as well as by profilometry.
1. EXPERIMENTAL RESULTS
1.1. OPTICAL PROPERTIES
Sputtering procedures of mirror specimens were
provided in the DSM stand [3], a simple double-mirror
magnetic system. An ECE discharge in deuterium or
argon (frequency 2.37 GHz) was served as an ion
source. Specimens with the size 22х22х4 mm were
fixed at a holder maintained at the room temperature.
The thickness of sputtered layer was estimated by
measuring the weight loss after every exposure of
specimens in plasma. In Fig. 1 are presented the results
of measurement of the light source image for mirrors in
initial state and after the layer of ~2.5 μm was sputtered
by Ar+ ions with 300 and 1000 eV (a and b on Fig. 1,
respectively). Fig. 2 shows the degradation of SR as the
function of ion energy for sputtered layer thickness
~2.5 μm.
-120 -80 -40 0 40 80 120
0,00
0,03
0,06
0,09
~ 40
,0
% - D
iffu
se
part
Im
ag
e
p
ro
fil
e
Angle, min
0 μm
2,52 μmSSIQ-3 (300V)
a
-120 -80 -40 0 40 80 120
0,00
0,03
0,06
0,09
~
96
%
- D
iffu
se
part
SSIQ-5 (1000V)
Im
ag
e
p
ro
fil
e
Angle, min
0 μm
2,47 μm
b
Fig. 1. IQ profiles obtained after bombardment of
SS specimens by Ar+ ions with energies 300 (a)
and 1000 eV (b)
0 200 400 600 800 1000
0,0
0,2
0,4
0,6
0,8
1,0
Sp
ec
ul
ar
r
ef
le
ct
.,
no
rm
al
iz
ed
Energy, eV
Ar-> SSIQ
Δh = ~ 2.5 μm
Fig. 2. Ion energy dependence of specular reflectance
after sputtering the layer of 2.5 μm in thickness
For comparison: measurement of SR by the method
described in [2] gives drop of reflectance ∆R = -9.5 %,
but the IQ method gives ∆R = -96 %.
ISSN 1562-6016. ВАНТ. 2012. №6(82) 115
Thus as follows from our comparative results:
1. IQ method demonstrates the dynamics of
correlation between specular reflectance (that is
responsible for quality of information on mirror optical
properties) and diffusive reflectance which is a
characteristic of surface relief developing due to
sputtering.
2. The higher ion energy, the faster surface
roughness grows and faster specular reflectance
degrades.
1.2. SURFACE CHARACTERISTICS
The analyses of surfaces with atomic force
microscope
(AFM) were provided after finishing the sputtering
procedures (the final thickness of sputtered layer for
every specimen is indicated in Table).
AFM data for two specimens are shown (Fig. 3,a) in
color, and the results of processing – in gray (Fig.3,b).
The oval spots on Fig. 3 are etching pits (the size
1…5 μm).
The processing of the AFM data is presented in
Fig. 3,b and Table.
Ei=300 eV Ei=1000 eV
Fig. 3. AFM data for specimens exposed to ions
with energy 300 eV and 1000 eV (a), and results
of processing (b)
Roughness of SS specimens sputtered with Ar+ ions
of different energy to comparable depth (~4 μm)
Energy of
Ar+ ions,
eV
Roughness parameters
(Ra) on mirror surface
after Δh thick layer was
sputtered, nm
Maximal
heights
(RZ), nm
300 170 ± 52, Δh = 4.1 μm ± 104
600 388 ± 76, Δh = 3.9 μm ± 134
1000 492 ± 162, Δh = 2.5 μm
787 ± 260, Δh = 4.0 μm ± 425
As seen, roughness developed due to sputtering is
higher for higher Ar ion energy. It means that the
difference between sputtering rate of differently
oriented grains increases with increasing ion energy.
Data for Δh=4.0 μm at Ei=1000 eV were obtained
from the dependence of Δm on ion fluence for this
specimen, shown in Fig. 4.
0 2 4 6 8 10 12 14 16
0
1
2
3
Sp
ut
te
re
d
m
as
s,
m
g
/ c
m
2
Fluence, ion / m2 (*1023)
300 eV
600 eV
1000 eV
Fig. 4. Mass loss depending on the ion fluence
A linear ion fluence dependence of Δh (which is
proportional to Δm – the mass loss) for ion energy
1000 eV (see Fig. 4) allows to predict the level of
roughness after sputtering the layer of 4 μm thick (see
Table). Thus the mean roughness value (Ra) for three
different Ar ion energies after sputtering the layer 4 μm
was found, Fig. 5. Such thickness layer would be
sputtered by charge exchange atoms for about one year
of ITER operation.
200 400 600 800 1000
0
200
400
600
800
1000
1200
R
ou
gh
ne
ss
(R
a)
, n
m
E, eV
Ar -> SS 316
Δh = 4.0 μm
Fig. 5. Roughness of the surface after sputtering the
layer of 4 μm in thickness
1.3. COMPARISON OF EFFECTS
OF SPUTTERING WITH D+ AND Ar+ IONS
High sensitivity of IQ method gives possibility to
provide comparison of sputtering effects caused by D+
and Ar+ ions. For this experiment two identical SS
mirror specimens were exposed in deuterium (SS N1)
and argon (SS N2) plasma ions with energy 600 eV.
The thickness of sputtered layer was ∆h~0.6 μm (the
mass loss ∆m~2.5 mg) and ∆h~1.6 μm (∆m~6 mg).
Fig. 6 shows the photos made in optical microscope at
the first stage of experiment.
SS N1 D+ ∆m= 2.57 mg SS N2 Ar+ ∆m= 2.42 mg
Fig. 6. Photos of specimens in optical microscope
a
b
116 ISSN 1562-6016. ВАНТ. 2012. №6(82)
.
-80 -60 -40 -20 0 20 40 60 80
0.00
0.05
0.10
Im
ag
e
p
ro
fil
e
Angle, min
SSN1 D+
SSN2 Ar+
N1 Δm = 2.65 mg
N2 Δm = 2.42 mg
a
-80 -60 -40 -20 0 20 40 60 80
0.00
0.05
0.10
Im
ag
e
p
ro
fil
e
Angle, min
SS N1 D+
SS N2 Ar+
N1 Δm = 6.25 mg
N2 Δm = 6.03 mg
b
Fig. 7. IQ profiles after sputtering the same thickness
layer with D and Ar ions. a – ∆h~0.6 μm (~2.5 mg),
b – ∆h~1.6 μm (~6 mg)
It is seen that, as distinct from sputtering with D+
ions, the Ar+ ion sputtering results in appearance of
some surface roughness, what is an evident indication
on stronger difference of sputtering rate for grains with
different orientations than in the case of D+ ions.
Correspondingly, the specular reflectance drops much
faster after bombardment with Ar+ ions than after D+
ions, as Fig. 7 demonstrates.
The effect of Ar+ ion sputtering on IQ reflectance
degradation for N2 is significantly greater than the
contribution of D+ ions sputtering for N1 specimen. IQ
reflectance of N2 specimen dropped catastrophically.
CONCLUSIONS
1. The methods used for investigating the quality of
reflectance by measuring the profile of an image of a
sharp light source (IQ method) is very sensitive to the
mirror surface state and can be used as an alternative to
the standard methods (i.e. integrating optical sphere).
2. Difference in sputtering rates of grains with
different orientations is stronger in the case of Ar+ ion
sputtering than in the case of D+ ion sputtering.
3. The fact of faster degradation of specular
reflectance under Ar+ ion bombardment indicates on
faster rise of surface roughness in comparison with
similar layer thickness sputtered by D+ ions.
4. The angle distribution of scattered light does not
follow cosθ dependence.
REFERENCES
1. A. Bardamid, V. Bryk, V. Konovalov, et al. //
Vacuum. 2000, v. 58, p. 10-15.
2. S. Tolansky. High Resolution Spectroscopy. New
York, Chicago, 1947.
3. A.F. Bardamid, V.T. Gritsyna, V.G. Konovalov, et al.
// Surface and Coatings Technology. 1998, v. 103-104,
p. 365-369.
Article received 16.10.12
ИЗМЕРЕНИЕ ЗЕРКАЛЬНОГО И ДИФФУЗНОГО КОМПОНЕНТОВ
КОЭФФИЦИЕНТА ОТРАЖЕНИЯ ПРИ РАСПЫЛЕНИИ СТАЛЬНЫХ ЗЕРКАЛ ИОНАМИ Ar+
В.Г. Коновалов, В.Н. Бондаренко, И.В. Рыжков, А.Н. Шаповал, А.Ф. Штань, O.O. Скорик,
С.И. Солодовченко, В.С. Войценя
Измерение изображения резко очерченного источника света, отраженного от зеркала (IQ-метод),
является очень чувствительным методом регистрации соотношения зеркального и диффузного компонентов
коэффициента отражения при распылении испытуемых образцов.
ВИМІРЮВАННЯ ДЗЕРКАЛЬНОГО ТА ДИФУЗНОГО КОМПОНЕНТІВ
КОЕФІЦІЄНТА ВІДБИТТЯ ПРИ РОЗПИЛЕННІ СТАЛЕВИХ ДЗЕРКАЛ ІОНАМИ Ar+
В.Г. Коновалов, В.М. Бондаренко, І.В. Рижков, А.М. Шаповал, А.Ф. Штань, O.O. Скорик,
С.І. Солодовченко, В.С. Войценя
Вимірювання зображення різко окресленого джерела світла, відбитого від дзеркала (IQ-метод), є дуже
чутливим методом реєстрації співвідношення дзеркального та дифузного компонентів коефіцієнта відбиття
при розпиленні випробовуваних зразків.
a
b
|