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Influence of external magnetic field on intensity and directivity of EUV radiation from high-current pulse plasma diode

This work is devoted to evaluate the influence of the additional external magnetic field on dynamics of the radiation in the extreme ultraviolet (EUV) range from multi-charged tin plasma of high-current pulse diode. Investigations have shown that the use of an additional external magnetic field has...

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Veröffentlicht in:	Вопросы атомной науки и техники
Datum:	2012
Hauptverfasser:	Borgun, Ie.V., Azarenkov, N.A., Hassanein, A., Tseluyko, A.F., Maslov, V.I., Ryabchikov, D.L., Grechko, Y.
Format:	Artikel
Sprache:	Englisch
Veröffentlicht:	Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2012
Schlagworte:	Низкотемпературная плазма и плазменные технологии
Online Zugang:	https://nasplib.isofts.kiev.ua/handle/123456789/109212
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:	Influence of external magnetic field on intensity and directivity of EUV radiation from high-current pulse plasma diode / Ie.V. Borgun, N.A. Azarenkov, A. Hassanein, A.F. Tseluyko, V.I. Maslov, D.L. Ryabchikov, Y. Grechko // Вопросы атомной науки и техники. — 2012. — № 6. — С. 184-186. — Бібліогр.: 2 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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