Plasma wakefield excitation providing homogeneous focusing of electron bunches

• Published in: Вопросы атомной науки и техники
• Date: 2013
• Main Authors: Maslov, V.I., Onishchenko, I.N., Yarovaya, I.P.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2013
• Subjects: Плазменная электроника
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/109273
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Plasma wakefield excitation providing homogeneous focusing of electron bunches / V.I. Maslov, I.N. Onishchenko, I.P. Yarovaya // Вопросы атомной науки и техники. — 2013. — № 1. — С. 134-136. — Бібліогр.: 4 назв. — англ.

Wakefield plasma lens, which focuses all relativistic electron bunches of the sequence identically and uniformly, are investigated analytically and by numerical simulation. The necessary conditions of such lens operation are the followings: length of the bunches is ξb=q(λ/2), q=1, 2, …(λ is the plas...