Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators
Investigations of simultaneous applying of high voltage glow discharge (HVGD) and non-self-maintained low-pressure arc discharge for obtaining high-quality titanium nitride coatings are provided. Obtained results are compared with experiments, provided on experimental technological equipment. Provid...
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| Datum: | 2007 |
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| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2007
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| Schriftenreihe: | Вопросы атомной науки и техники |
| Schlagworte: | |
| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/110505 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators / S.V. Denbnovetskiy, V.I. Melnyk, I.V. Melnyk, B.A. Tugay, P.V. Porytskyy // Вопросы атомной науки и техники. — 2007. — № 1. — С. 167-169. — Бібліогр.: 5 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| Zusammenfassung: | Investigations of simultaneous applying of high voltage glow discharge (HVGD) and non-self-maintained low-pressure arc discharge for obtaining high-quality titanium nitride coatings are provided. Obtained results are compared with experiments, provided on experimental technological equipment. Provided investigations showed, that using of glow discharge electron guns (GDEG) in installations for obtaining of chemically-complex compounds with plasma activation lead to simplifying of technological equipment and to improving the films quality. For investigated electrical parameters there are no necessary special technical measures for providing both HVGD and arc stability, early considered simple technical solutions are enough. Using of simple mechanical pumps for realizing binary films deposition in the range of operation pressure 10⁻² – 1 Pa with joint pumping of electron gun and technological chamber is also possible. Necessary technological equipment can be elaborated in correspondence with the customers’ requirement. |
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