Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators
Investigations of simultaneous applying of high voltage glow discharge (HVGD) and non-self-maintained low-pressure arc discharge for obtaining high-quality titanium nitride coatings are provided. Obtained results are compared with experiments, provided on experimental technological equipment. Provid...
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| Zitieren: | Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators / S.V. Denbnovetskiy, V.I. Melnyk, I.V. Melnyk, B.A. Tugay, P.V. Porytskyy // Вопросы атомной науки и техники. — 2007. — № 1. — С. 167-169. — Бібліогр.: 5 назв. — англ. |
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Denbnovetskiy, S.V. Melnyk, V.I. Melnyk, I.V. Tugay, B.A. Porytskyy, P.V. 2017-01-04T17:16:03Z 2017-01-04T17:16:03Z 2007 Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators / S.V. Denbnovetskiy, V.I. Melnyk, I.V. Melnyk, B.A. Tugay, P.V. Porytskyy // Вопросы атомной науки и техники. — 2007. — № 1. — С. 167-169. — Бібліогр.: 5 назв. — англ. 1562-6016 PACS: 52.80.Hc https://nasplib.isofts.kiev.ua/handle/123456789/110505 Investigations of simultaneous applying of high voltage glow discharge (HVGD) and non-self-maintained low-pressure arc discharge for obtaining high-quality titanium nitride coatings are provided. Obtained results are compared with experiments, provided on experimental technological equipment. Provided investigations showed, that using of glow discharge electron guns (GDEG) in installations for obtaining of chemically-complex compounds with plasma activation lead to simplifying of technological equipment and to improving the films quality. For investigated electrical parameters there are no necessary special technical measures for providing both HVGD and arc stability, early considered simple technical solutions are enough. Using of simple mechanical pumps for realizing binary films deposition in the range of operation pressure 10⁻² – 1 Pa with joint pumping of electron gun and technological chamber is also possible. Necessary technological equipment can be elaborated in correspondence with the customers’ requirement. Досліджується сумісне застосування високовольтного тліючого розряду (ВТР) та несамостійного вакуумно-дугового розряду низького тиску для отримання високоякісних покриттів із нітриду титана. Отримані теоретичні результати підтверджуються експериментами, проведеними на технологічному обладнанні. Проведені дослідження показали, що використання газорозрядних гармат в електронно-променевому обладнанні, призначеному для осадження хімічно складних покриттів та використання дугового розряду для активації плазми, дозволяють спростити електронно-променеве обладнання та поліпшити якість отримуваних покриттів. Исследуется совместное применение высоковольтного тлеющего разряда (ВТР) и несамостоятельного вакуумно-дугового разрядов низкого давления для получения высококачественных покрытий из нитрида титана. Полученные теоретические результаты подтверждаются экспериментами, проведенными на технологическом оборудовании. Проведенные исследования показали, что использование газоразрядных электронных пушек (ГРЭП) в электронно-лучевом оборудовании, предназначенном для нанесения покрытий сложного химического состава, совместно с использованием дугового разряда для активации плазмы, позволяет упростить электронно-лучевое оборудование и повысить качество получаемых покрытий. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators Дослідження характеристик несамостійного дугового разряду у парах титану у газорозрядних електронних випарниках Исследование характеристик несамостоятельного дугового разряда в парах титана в газоразрядных электронных испарителях Article published earlier |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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DSpace DC |
| title |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators |
| spellingShingle |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators Denbnovetskiy, S.V. Melnyk, V.I. Melnyk, I.V. Tugay, B.A. Porytskyy, P.V. Low temperature plasma and plasma technologies |
| title_short |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators |
| title_full |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators |
| title_fullStr |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators |
| title_full_unstemmed |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators |
| title_sort |
investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators |
| author |
Denbnovetskiy, S.V. Melnyk, V.I. Melnyk, I.V. Tugay, B.A. Porytskyy, P.V. |
| author_facet |
Denbnovetskiy, S.V. Melnyk, V.I. Melnyk, I.V. Tugay, B.A. Porytskyy, P.V. |
| topic |
Low temperature plasma and plasma technologies |
| topic_facet |
Low temperature plasma and plasma technologies |
| publishDate |
2007 |
| language |
English |
| container_title |
Вопросы атомной науки и техники |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| format |
Article |
| title_alt |
Дослідження характеристик несамостійного дугового разряду у парах титану у газорозрядних електронних випарниках Исследование характеристик несамостоятельного дугового разряда в парах титана в газоразрядных электронных испарителях |
| description |
Investigations of simultaneous applying of high voltage glow discharge (HVGD) and non-self-maintained low-pressure arc discharge for obtaining high-quality titanium nitride coatings are provided. Obtained results are compared with experiments, provided on experimental technological equipment. Provided investigations showed, that using of glow discharge electron guns (GDEG) in installations for obtaining of chemically-complex compounds with plasma activation lead to simplifying of technological equipment and to improving the films quality. For investigated electrical parameters there are no necessary special technical measures for providing both HVGD and arc stability, early considered simple technical solutions are enough. Using of simple mechanical pumps for realizing binary films deposition in the range of operation pressure 10⁻² – 1 Pa with joint pumping of electron gun and technological chamber is also possible. Necessary technological equipment can be elaborated in correspondence with the customers’ requirement.
Досліджується сумісне застосування високовольтного тліючого розряду (ВТР) та несамостійного вакуумно-дугового розряду низького тиску для отримання високоякісних покриттів із нітриду титана. Отримані теоретичні результати підтверджуються експериментами, проведеними на технологічному обладнанні. Проведені дослідження показали, що використання газорозрядних гармат в електронно-променевому обладнанні, призначеному для осадження хімічно складних покриттів та використання дугового розряду для активації плазми, дозволяють спростити електронно-променеве обладнання та поліпшити якість отримуваних покриттів.
Исследуется совместное применение высоковольтного тлеющего разряда (ВТР) и несамостоятельного вакуумно-дугового разрядов низкого давления для получения высококачественных покрытий из нитрида титана. Полученные теоретические результаты подтверждаются экспериментами, проведенными на технологическом оборудовании. Проведенные исследования показали, что использование газоразрядных электронных пушек (ГРЭП) в электронно-лучевом оборудовании, предназначенном для нанесения покрытий сложного химического состава, совместно с использованием дугового разряда для активации плазмы, позволяет упростить электронно-лучевое оборудование и повысить качество получаемых покрытий.
|
| issn |
1562-6016 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/110505 |
| citation_txt |
Investigation of characteristics of non-simultaneous arc discharge in titanium vapors in glow discharge electron evaporators / S.V. Denbnovetskiy, V.I. Melnyk, I.V. Melnyk, B.A. Tugay, P.V. Porytskyy // Вопросы атомной науки и техники. — 2007. — № 1. — С. 167-169. — Бібліогр.: 5 назв. — англ. |
| work_keys_str_mv |
AT denbnovetskiysv investigationofcharacteristicsofnonsimultaneousarcdischargeintitaniumvaporsinglowdischargeelectronevaporators AT melnykvi investigationofcharacteristicsofnonsimultaneousarcdischargeintitaniumvaporsinglowdischargeelectronevaporators AT melnykiv investigationofcharacteristicsofnonsimultaneousarcdischargeintitaniumvaporsinglowdischargeelectronevaporators AT tugayba investigationofcharacteristicsofnonsimultaneousarcdischargeintitaniumvaporsinglowdischargeelectronevaporators AT porytskyypv investigationofcharacteristicsofnonsimultaneousarcdischargeintitaniumvaporsinglowdischargeelectronevaporators AT denbnovetskiysv doslídžennâharakteristiknesamostíinogodugovogorazrâduuparahtitanuugazorozrâdnihelektronnihviparnikah AT melnykvi doslídžennâharakteristiknesamostíinogodugovogorazrâduuparahtitanuugazorozrâdnihelektronnihviparnikah AT melnykiv doslídžennâharakteristiknesamostíinogodugovogorazrâduuparahtitanuugazorozrâdnihelektronnihviparnikah AT tugayba doslídžennâharakteristiknesamostíinogodugovogorazrâduuparahtitanuugazorozrâdnihelektronnihviparnikah AT porytskyypv doslídžennâharakteristiknesamostíinogodugovogorazrâduuparahtitanuugazorozrâdnihelektronnihviparnikah AT denbnovetskiysv issledovanieharakteristiknesamostoâtelʹnogodugovogorazrâdavparahtitanavgazorazrâdnyhélektronnyhisparitelâh AT melnykvi issledovanieharakteristiknesamostoâtelʹnogodugovogorazrâdavparahtitanavgazorazrâdnyhélektronnyhisparitelâh AT melnykiv issledovanieharakteristiknesamostoâtelʹnogodugovogorazrâdavparahtitanavgazorazrâdnyhélektronnyhisparitelâh AT tugayba issledovanieharakteristiknesamostoâtelʹnogodugovogorazrâdavparahtitanavgazorazrâdnyhélektronnyhisparitelâh AT porytskyypv issledovanieharakteristiknesamostoâtelʹnogodugovogorazrâdavparahtitanavgazorazrâdnyhélektronnyhisparitelâh |
| first_indexed |
2025-11-26T09:50:03Z |
| last_indexed |
2025-11-26T09:50:03Z |
| _version_ |
1850619818145742848 |
| fulltext |
Problems of Atomic Science and Technology. 2007, 1. Series: Plasma Physics (13), p. 167-169 167
INVESTIGATION OF CHARACTERISTICS OF NON-SIMULTANEOUS
ARC DISCHARGE IN TITANIUM VAPORS IN GLOW DISCHARGE
ELECTRON EVAPORATORS
S.V. Denbnovetskiy1, V.I. Melnyk1, I.V. Melnyk1, B.A. Tugay1, P.V. Porytskyy2
1National Technical University of Ukraine, Pr. Peremogy 37, build.12, 03056 Kyiv, Ukraine,
e-mail: imelnik@edd.ntu-kpi.kiev.ua;
2Institute for Nuclear Research of NASU, Pr. Nauky 47, 03680 Kiev, Ukraine,
e-mail: poryts@kinr.kiev.ua
Investigations of simultaneous applying of high voltage glow discharge (HVGD) and non-self-maintained low-
pressure arc discharge for obtaining high-quality titanium nitride coatings are provided. Obtained results are compared
with experiments, provided on experimental technological equipment. Provided investigations showed, that using of glow
discharge electron guns (GDEG) in installations for obtaining of chemically-complex compounds with plasma activation
lead to simplifying of technological equipment and to improving the films quality. For investigated electrical parameters
there are no necessary special technical measures for providing both HVGD and arc stability, early considered simple
technical solutions are enough. Using of simple mechanical pumps for realizing binary films deposition in the range of
operation pressure 10-2 – 1 Pa with joint pumping of electron gun and technological chamber is also possible. Necessary
technological equipment can be elaborated in correspondence with the customers’ requirement.
PACS: 52.80.Hc
INTRODUCTION
Among the modern methods of coatings deposition
in the vacuum, important place is occupied by the
electron beam evaporation, which find application in
such important branches of industry as electronic, inst-
rument-making, machine-building and other. Main ad-
vantage of such technologies is direct heating of evapo-
rated material by the powerful electron beam and its
evaporation from the water-cooled crucible, which pro-
vided the high purity of coatings with high deposition
rate. In such conditions of obtaining of coatings its mic-
rostructure and properties are noticeably improved by
ionizing of vapor flows with controlled ions concen-
tration. Such kind of deposition is called plasma ac-
tivated deposition, where chemical compound are
created from evaporated metal and residual gases [1]. In
this paper the method of evaporation, based on
combining of electron beam heating by the high voltage
glow discharge electron gun and plasma activation of
vapors in the vacuum non-self-maintained arc discharge is
described. Main singularities of realizing of this method on
the technological equipment and required technical means
are described. As a conclusion main obtained
experimental discharge characteristics are presented and
branches of profitable using of such evaporators are
pointed out.
THE STRUCTURE AND PRINCIPLE
OF OPERATION OF ELECTRON BEAM
EVAPORATOR WITH PLASMA
ACTIVATION
Scheme of construction of glow discharge electron beam
evaporator is presented at Fig. 1. The main element of this
construction is glow discharge electron gun 1, which formed
the electron beam with large convergence angle 2 and
connected with technological chamber 5 by guiding cannel
3, on which located the focusing magnetic lenses 5 [2].
Geometry parameters of guiding system is depended
on required pressure in technological chamber and
allowable losses of beam current. Interdependence of those
parameters was analyzed in paper [3], where the methodic
of calculation of guiding system geometry also have been
proposed [3]. The ordinary parts, located in the
technological chamber, included water-cooled crucible 6
with evaporated material 7, and substrates 10 where
ionized vapour 9 condensates. As for rules of electrical
connection, crucible in such systems is usually located at
zero potential, and the substrates are electrically isolated
from chamber for its treatment in discharge plasma by
using ion bombarding [4,5]. Ring-like electrode 8 is used
as anode for lighting of non-self-maintained vacuum arc
discharge and for plasma-activation of vapours and residual
gases for increasing the rate of chemical reaction between
metal’s and gas components [5]. In the main principles
such construction of evaporator is coincide with similar
evaporators, where hot cathode electron guns are used [1],
but using of high voltage glow discharge electron guns is
lead to combination of two form of discharges in one tech-
nological equipment. Therefore, for realizing of deposition
of binary compounds with using GDEG, experimental
investigation of physics of used discharges is necessary.
Plasma-activated deposition of binary compounds with
including of gas components is usually realized in relative-
ly high operation pressure range of 10-1–10-2 Pa with
inputting of active gases. Clearly, those traditional electron
guns with hot cathodes are not profitable to using in such
vacuum conditions [1]. But the best way to complex solu-
tion of this technical problem is using of other types of
electron guns, which are stably operated in required
physical conditions. Among such novel types of guns the
glow discharge electron guns, based on HVGD, perspective
to using for plasma-activated deposition of coatings in the
soft vacuum [2].
mailto:imelnik@edd.ntu-kpi.kiev.ua
mailto:poryts@kinr.kiev.ua
168
Fig.1 Scheme of construction of electron-beam evaporator with plasma activation in the arc discharge:
1 electron gun; 2 electron beam; 3 beam guiding system; 4 magnetic lenses; 5 technological chamber;
6 crucible; 7 evaporated material; 8 anode of arc discharge; 9 vapor; 10 substrate, 11 deflection system
Such guns are operated in physical conditions of HVGD,
which are correspond to range of pressure units or tens Pa
and power density of electron beam from the cathode
surface is till 106 W/cm2. Another problem of electron
beam evaporation is the low level of vapor ionizing by high
energy beam electrons. Therefore, lighting of additional
non-self-maintained arc discharge near the surface of
evaporation is also necessary [1,5].
EXPERIMENTAL INVESTIGATION
OF INTERINFLUENCE BETWEEN HVGD
AND VACUUM ARC DISCHARGE
Current-voltage characteristic of non-self-maintained
arc discharge in titanium vapor and nitrogen gas media are
presented in Fig. 2 and 3, and dependence of arc current
form parameters of electron gun presented in Fig. 4
Fig. 2. Current-voltage characteristics of arc discharge
for different beam power for pressure in technological
chamber 10-2 Pa and acceleration voltage 12 kV. HVGD
current: 1 150 mA; 2 180 mA; 3 200 mA;
4 250 mA; 5 300 mA
Fig. 3. Current-voltage characteristics of arc discharge
for different beam power for pressure in technological
chamber 1 Pa and acceleration voltage 12 kV. HVGD
current: 1 150 mA; 2 180 mA; 3 200 mA;
4 250 mA; 5 300 mA
The photograph of microstructure of cutting cross
section of obtained titanium nitride films shown at Fig. 5.
This film was deposited on experimental installation with
glow discharge electron gun, and combination of high-rate
electron beam evaporation with plasma activation of
titanium vapors in nitrogen where used. One can see that
the structure of obtained films is very smooth, and
including only small and negligible microcrakes, drop
fractions and other defects is observed. Obtaining of better
structures also may be possible with increasing arc current
and the power of electron beam.
20 40 60 80
2
4
6
8
10
12
14
16 5
4
3
2
1
Ud, V
d, A
water
pumping
20-60 V
–
+
-0.1-1 kV1
2
3
4
5 6
7
8
10
9
11
20 40 60 80
2
4
6
8
10
12
14
16
4
3
2
1
Ud, V
d, A
169
Fig. 4. Dependence of arc discharge parameters from
HVGD parameters for different voltages of arc discharge:
1 Ud =20 V; 2 Ud =30 V; 3 Ud =40 V
Fig. 5. Microstructure of obtained titanium nitride films in
the cross section with 25000 magnification
CONCLUSIONS
Provided experimental investigation shown, that using
of GDEG in installations for obtaining of binary com-
pounds with plasma activation lead to simplifying of
technological equipment and improving the films quality.
For investigated electrical parameters there aren’t ne-
cessary special technical measures for providing both
HVGD and arc stability, early considered simple technical
solutions are enough. Using of simple mechanical pumps
for realizing films deposition in the range of operation
pressure 10-2 – 1 Pa with joint pumping of electron gun
and technological chamber is also possible. Necessary
technological equipment can be elaborated by authors
corresponding to the customers’ requirement.
REFERENCES
1. K. Goedicke, B. Scheffel, S. Schiller. Plasma-activated
high-rate electron beam evaporation using a spotless
cathodic arc // Surface coating and technology.
1994, N68/69, p. 799-803.
2. S.V. Denbnovetsky, V.G. Melnyk, I.V. Melnyk. High
voltage glow discharge electron sources and possibilities
of its application in industry for realizing of different
technological operations // IEEE Transactions on plasma
science. 2003, October, v.31, N5, p. 987-993.
3. I.V. Melnyk. Simulation of electron beam guiding from
region of soft vacuum to region of high vacuum in the
equipotential channel // Electronic modeling. 2001, v. 23,
N4, p. 82-92.
4. S.V. Denbnovetsky, V.I. Melnyk, I.V. Melnyk,
B.A. Tugay. Using of Gas-Discharge Electron Beam Eva-
porator for Obtaining of Chemically-Complex Compo-
unds Coatings // 6-th International Conference on
Electron Beam Technologies EBT-2000, Varna, Bulgaria,
4-7 June, 2000/ Book of Abstracts, p. 117-118.
5. V.G. Melnyk, I.V. Melnyk. Theoretical estimations of
productivity of chemical reactions between titanium
vapors and active gases in arc discharge for technological
process of electron beam deposition of defense coatings //
15-th International Symposium on Plasma Chemistry.
Symposium Proceedings, July, 10, 2001. Poster
Contributions, 2-nd Session, v. 5, p. 1959-1963.
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