Cylindrical magnetron based on the plasmaoptical principles
The operation of any magnetron-type sputtering system is based on using of anomalous glow discharge in a crossed E ┴ B fields. In such systems a principle of magnetic isolation of electrons is realized and idea of magnetic lines equipotentialization for control of ions flow on cathode-target can be...
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| Date: | 2007 |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2007
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| Cite this: | Cylindrical magnetron based on the plasmaoptical principles / A.M. Dobrovol's'kii, A.N. Evsyukov, A.A. Goncharov, I.M. Protsenko // Вопросы атомной науки и техники. — 2007. — № 1. — С. 151-153. — Бібліогр.: 7 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1859860261992660992 |
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| author | Dobrovol's'kii, A.M. Evsyukov, A.N. Goncharov, A.A. Protsenko, I.M. |
| author_facet | Dobrovol's'kii, A.M. Evsyukov, A.N. Goncharov, A.A. Protsenko, I.M. |
| citation_txt | Cylindrical magnetron based on the plasmaoptical principles / A.M. Dobrovol's'kii, A.N. Evsyukov, A.A. Goncharov, I.M. Protsenko // Вопросы атомной науки и техники. — 2007. — № 1. — С. 151-153. — Бібліогр.: 7 назв. — англ. |
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| container_title | Вопросы атомной науки и техники |
| description | The operation of any magnetron-type sputtering system is based on using of anomalous glow discharge in a crossed E ┴ B fields. In such systems a principle of magnetic isolation of electrons is realized and idea of magnetic lines equipotentialization for control of ions flow on cathode-target can be applied quite well. In the present work, with consistent taking these principles into account, the sample of axially-symmetric cylindrical sputtering system of magnetron type is proposed, elaborated and tested.
Використання аномального жевріючого розряду в схрещених електричному та магнітному полях є основою функціонування будь-якої магнетронної розпилюючої системи. В таких системах виконується принцип магнітної ізоляції електронів та може бути застосована ідея еквіпотенціалізації магнітних силових ліній з метою керування iонним потоком на катоді-мішені. На основі послідовного використання вказаних плазмооптичних принципів було запропоновано, реалізовано та досліджено варіант аксіально-симетричної циліндричної розпилюючої системи магнетронного типу.
Использование аномального тлеющего разряда в скрещенных электрических и магнитных полях является основой функционирования любой магнетронной распылительной системы. В таких системах выполняется принцип магнитной изоляции электронов и может быть применена идея эквипотенциализации магнитных силовых линий для управления ионным потоком на катоде-мишени. На основе последовательного применения указанных плазмооптических принципов предложен, реализован и исследован вариант аксиально-симметричной цилиндрической распылительной системы магнетронного типа.
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| first_indexed | 2025-12-07T15:45:24Z |
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Problems of Atomic Science and Technology. 2007, 1. Series: Plasma Physics (13), p. 151-153 151
CYLINDRICAL MAGNETRON BASED
ON THE PLASMAOPTICAL PRINCIPLES
A.M. Dobrovol's'kii, A.N. Evsyukov, A.A. Goncharov, I.M. Protsenko
Institute of Physics of the National Academy of Sciences of Ukraine, Kiev, Ukraine,
e-mail: evsyukov@iop.kiev.ua
The operation of any magnetron-type sputtering system is based on using of anomalous glow discharge in a crossed
BE ⊥ fields. In such systems a principle of magnetic isolation of electrons is realized and idea of magnetic lines
equipotentialization for control of ions flow on cathode-target can be applied quite well. In the present work, with
consistent taking these principles into account, the sample of axially-symmetric cylindrical sputtering system of
magnetron type is proposed, elaborated and tested.
PACS:52.25.Xz,52.27.Aj,52.40.Hf,52.50.Dg,52.75.-d,52.77.-j,52.77.Bn,52.77.Dq,52.80.-s,52.80.Sm,52.80.Vp
1. INTRODUCTION
It is hardly possible to imagine the modern plasma
technologies of processing of the new exotic materials
and functional coatings with given properties without DC
and AC magnetron sputtering systems. In spite of the fact
that magnetron sputtering systems are known already for
a long time and are successfully used in technologies, the
sufficient understanding of the physical processes
determining their operation is not too clear till now. All
such plasmadynamic systems with magnetic isolation of
electrons can be divided into two greater classes – planar
and cylindrical ones.
Cylindrical magnetrons were proposed by Penfold and
Thornton in the mid-1970s. The results of investigations
of their properties are presented by a lot of references[1-
3]. Both their main advantages and disadvantages are
well-known. The operation of any magnetron-type
sputtering system is based on use of anomalous glow
discharge in a crossed BE ⊥ fields. It is possible to
apply plasmaoptics principles, proposed firstly by
A.I. Morozov [4,5], to plasmadynamic systems of such
types. In the present work, with consistent taking these
principles into account, the sample of axially-symmetric
cylindrical sputtering system of magnetron type is
proposed, elaborated and tested.
2. EXPERIMENTAL CONDITIONS
The experiments were carried out at the setup
schematically shown in Fig. 1. Cylindrical magnetron
sputtering system is placed in the vacuum chamber. There
are two opportunities to place samples (4) in the internal
magnetron volume: one cylindrical sample directly at the
axis or several samples in nosepiece (5). Magnetron has
magnetic system (1) assembled on permanent magnets
and cooled cathode (2). Cathode is cooled due to thermal
contact with reservoir with cold water being pumped
through it. Cylindrical cathode made of copper with
59 mm internal diameter, 67 mm outer one and 63 mm
height is used. Anode system (3) consists of two
moveable units and allows to set different anodes on
various depths from outside section of magnetic system at
the magnetron axis. It is possible to obtain single anode
(when both anode units are connected) or split ones (when
there is a gap between the anode units in cathode region
localization). Anode electrodes are made of nonmagnetic
steel. Usually anode unit has 6 rods located in parallel to
working cathode surface and uniformly along a circle.
Distance between the anode and the cathode can be
adjusted. Besides, single anode rod can be located exactly
at the magnetron axis. Working gas (argon) is supplied
directly into the chamber and produces working pressure
from 10-5 up to 10-2 Torr.
Magnetron magnetic system forms axially symmetric
magnetic field (see Fig. 2). The magnetic system
boundaries are shown by solid parallel line (3) in this
figure. Rectangles (1) show cathode localization. Anodes
localization are shown by rectangles (2). The
configuration of magnetic field lines provides formation
of magnetic trap for electrons above the cathode surface
and magnetic insulation from the anodes. Magnetic field
value at the axis of system is about 0.065 T, and one
nearby the cathode surface – 0.075 T. Magnetron
magnetic field lines were calculated as lines of equal
magnetic flux ( =const). The magnetic flux values were
evaluated from magnitudes of magnetic field BZ
accordingly to the following equation:
.
2
1
zr
Bz ∂
∂
⋅
⋅
=
ψ
π
Photographs of discharges were made in case of
absence of bottom anode module by digital camera.
Fig. 1. Principle scheme of the experiments with
magnetron type sputtering system.
1-magnetic system; 2-cathode;3-anode;
4-sample;5-samples holder
mailto:evsyukov@iop.kiev.ua
152
The physical processes determining behavior of this
sputtering system can be close to plasma accelerator with
closed electron drift and extended acceleration zone [6].
3. RESULTS
In our experiments plasmaoptical magnetron operated
in two modes corresponding to the different types of
discharges. The photos of this discharge are shown in
Fig.3. It is possible to achieve these regimes by pressure
increase. Dependencies of discharge voltage and current
via pressure are presented on Fig. 4.
The first discharge mode is characterized by low
current (up to 100 mA). The upper limit of existence of
this mode is correlated with plasmadynamic and
geometric parameters (e.g. breakdown voltage, cathode
surface cleanness, cathode-anode distance) and is about
3·10-3 Torr. During pressure increase the current value and
the luminescence intensity are growing.
The second discharge mode is characterized by high
current (up to 2 A in our experiments) and high
luminescence intensity. Switch to this mode occurrs in
spurts with change of discharge color from blue to green.
The bottom limit of existence of this magnetron discharge
mode is correlated with plasmadynamic and geometric
parameters too and is about 5·10-3 Torr. During pressure
increase the current value and the luminescence intensity
are growing. As one can see from Fig. 4, curve 1
conforms to the first discharge regime in all pressure
range. Thus magnetron discharge regime has both
pressure and breakdown voltage limits.
One can see from Fig. 2 that in the central part of the
cathode region magnetic field lines extend in parallel
enough way to the cathode surface. Use of split anodes
leads to formation of virtual ones along these lines. In this
case we have the treatment of all cathode surface without
anode shadows on samples surface. Experiments show
that the magnetron continues its normal operation up to
virtual anode size of 55 mm. Cathode surface inspection
after the sputtering test shows the whole cathode surface
etching with more intensive zone in the central plane
(about 60% width relatively to total cathode height).
Considering ions arriving to the cathode surface from
edge of plasma positive column in accordance with well-
known formula we can calculate the density of charged
particles for high-current mode the discharge:
,24.0,)1(
i
e
iiiC M
Tknejjj ⋅⋅
⋅⋅⋅=⋅+= γ
where jC- current density on cathode ( j c=
I d
SC
, SC -
cathode square), ji- ions current density, - secondary
electron emission coefficient (is about 0.1), ni- ions
density, Mi- ion mass (Ar), Te- electron temperature. Thus
ions density is about 1.54x1013 cm-3. Ionization degree in
this system is higher than that in typical magnetron and is
about 8 %. We suppose that electron temperature is about
20 eV.
Under conditions of our experiments in high-current
operation mode deposition rate was about 500 nm/min.
Taking into consideration ion current density and
deposition rate we can estimate a sputter yield Y:
Fig. 2. Magnetron magnetic field lines ( Wb)
1-cathodes; 2-anodes; 3-magnetic system boundaries
Fig. 3. Photos of discharges in different modes.
1 - P=3x10-3 Torr, Id=40mA, Ud=2000V;
2 - P=6x10-3 Torr, Id=1.25A, Ud=400V
153
17.13 =
⋅
⋅
=
ija
eDY ,
where D – deposition rate, a - identity parameter (2.2 Å for
copper). We can suppose that argon ion energy is about
350 eV [7]. That fact confirms existence of cathode potential
drop and plasma positive column in region of the anodes.
Plasmaoptical principles suggest virtual anode
existence. These principles require a presence of
magnetized electrons and nonmagnetized ions. These
criterion can be written as
,, LrLr ie <>
where re and ri – are Larmor radii of electron and ion
correspondingly, L – cathode-anode distance ( 10 mm).
On high-current mode for fast electrons in cathode region
(Te 350 eV) and for slow ions in plasma positive column
(Ti 20 eV) we can write
r e 1mm ,ri 60mm , L 10mm.
As one can see the necessary conditions for plasmaoptical
principles are created and existence of virtual anode is
experimentally confirmed.
CONCLUSIONS
We describe a consistent application of plasmaoptical
principles of magnetic isolation and equipotentialization
of magnetic field lines for creation of sputtering system
magnetron type. We carried out tests and some
preliminary investigations of its operation.
Discharge in cylindrical magnetron with strong
magnetic field in the whole volume has two main stages.
Transition between the discharge stages happens in spurts.
High-current stage is characterized by abrupt voltage
reduction with current growth in spurts and weak
dependence of working voltage on pressure.
Anode to cathode distance and the anode localization
determine some peculiarities of the magnetron operation.
Efficient high-current discharge glow is possible in the
pressure range from 5x10-3 Torr. Preliminary sample
preparation before sputtering is possible immediately in
this magnetron. In our experiments high-current mode
allows to achieve sputtering rate from copper target of
about 500 nm/min.
REFERENCES
1. J.A.Thornton, A.S. Penfold. Thin Film Processes.
New York:”Academic Press”,1978.
2 D.A. Glocker, M.M. Romach, V.W. Lindberg. Recent
developments in inverted cylindrical magnetron
sputtering // Surface and Coating Technol. 2001,
v.146-147, p. 457-462.
3. M. Amberg, J. Geerk, M. Keller, A. Fischer. Desing,
characterisation and operation of an inverted
cylindrical magnetron for metal deposition // Plasma
Devices and Operations. 2004, v.12, N 3, p. 175-186.
4. A.I. Morozov. Focusing of Cold Quasineutral Beams in
Electromagnetic Fields // Soviet Physics – Doklady.
1966, v10, N8, p.775-777.
5. A. Morozov and S. Lebedev. Reviews of Plasma
Physics / ed. by M. Leontovich. New York:
“Consultants Bureau”, 1975.
6. A.I. Morozov, Yu.V. Esinchuk, G.N. Tilinin,
A.V.Trofimov, Yu.A.Shchepkin. Plasma Accelerator
with Closed Electron Drift and Extended Acceleration
Zone // Soviet Physics Technical Physics. 1972, v.17,
p. 38.
7. H. Coufal, H.F. Winter and H.L. Bay. Energy transfer
from noble-gas ions to surfaces: Collision with carbon,
silicon, copper, silver, and gold in the range 100-
4000 eV // Phys. Rev. B. 1991, v.44, N10, p. 4747.
. , . , . , .
.
.
, -
.
. , . , . , .
.
i .
,
.
Fig. 4. Dependencies of discharge voltage [Ud](solid
lines) and current [Id](dash lines) on pressure
at different maximum discharge power:
1 – 0.5 W; 2 – 300W; 3 – 600W; 4 - 900W
|
| id | nasplib_isofts_kiev_ua-123456789-110509 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1562-6016 |
| language | English |
| last_indexed | 2025-12-07T15:45:24Z |
| publishDate | 2007 |
| publisher | Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| record_format | dspace |
| spelling | Dobrovol's'kii, A.M. Evsyukov, A.N. Goncharov, A.A. Protsenko, I.M. 2017-01-04T17:23:01Z 2017-01-04T17:23:01Z 2007 Cylindrical magnetron based on the plasmaoptical principles / A.M. Dobrovol's'kii, A.N. Evsyukov, A.A. Goncharov, I.M. Protsenko // Вопросы атомной науки и техники. — 2007. — № 1. — С. 151-153. — Бібліогр.: 7 назв. — англ. 1562-6016 https://nasplib.isofts.kiev.ua/handle/123456789/110509 PACS:52.25.Xz,52.27.Aj,52.40.Hf,52.50.Dg,52.75.-d,52.77.-j,52.77.Bn,52.77.Dq,52.80.-s,52.80.Sm,52.80.Vp The operation of any magnetron-type sputtering system is based on using of anomalous glow discharge in a crossed E ┴ B fields. In such systems a principle of magnetic isolation of electrons is realized and idea of magnetic lines equipotentialization for control of ions flow on cathode-target can be applied quite well. In the present work, with consistent taking these principles into account, the sample of axially-symmetric cylindrical sputtering system of magnetron type is proposed, elaborated and tested. Використання аномального жевріючого розряду в схрещених електричному та магнітному полях є основою функціонування будь-якої магнетронної розпилюючої системи. В таких системах виконується принцип магнітної ізоляції електронів та може бути застосована ідея еквіпотенціалізації магнітних силових ліній з метою керування iонним потоком на катоді-мішені. На основі послідовного використання вказаних плазмооптичних принципів було запропоновано, реалізовано та досліджено варіант аксіально-симетричної циліндричної розпилюючої системи магнетронного типу. Использование аномального тлеющего разряда в скрещенных электрических и магнитных полях является основой функционирования любой магнетронной распылительной системы. В таких системах выполняется принцип магнитной изоляции электронов и может быть применена идея эквипотенциализации магнитных силовых линий для управления ионным потоком на катоде-мишени. На основе последовательного применения указанных плазмооптических принципов предложен, реализован и исследован вариант аксиально-симметричной цилиндрической распылительной системы магнетронного типа. en Національний науковий центр «Харківський фізико-технічний інститут» НАН України Вопросы атомной науки и техники Low temperature plasma and plasma technologies Cylindrical magnetron based on the plasmaoptical principles Циліндричний магнетрон на принципах плазмооптики Цилиндрический магнетрон на принципах плазмооптики Article published earlier |
| spellingShingle | Cylindrical magnetron based on the plasmaoptical principles Dobrovol's'kii, A.M. Evsyukov, A.N. Goncharov, A.A. Protsenko, I.M. Low temperature plasma and plasma technologies |
| title | Cylindrical magnetron based on the plasmaoptical principles |
| title_alt | Циліндричний магнетрон на принципах плазмооптики Цилиндрический магнетрон на принципах плазмооптики |
| title_full | Cylindrical magnetron based on the plasmaoptical principles |
| title_fullStr | Cylindrical magnetron based on the plasmaoptical principles |
| title_full_unstemmed | Cylindrical magnetron based on the plasmaoptical principles |
| title_short | Cylindrical magnetron based on the plasmaoptical principles |
| title_sort | cylindrical magnetron based on the plasmaoptical principles |
| topic | Low temperature plasma and plasma technologies |
| topic_facet | Low temperature plasma and plasma technologies |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/110509 |
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