Production of metal and dielectric films in a combined RF and arc discharge

• Published in: Вопросы атомной науки и техники
• Date: 2003
• Main Authors: Gasilin, V.V., Kunchenko, V.V., Nezovybat’ko, Yu.N., Taran, A.V., Taran, V.S., Tereshin, V.I., Shvets, O.M.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2003
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/110611
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Production of metal and dielectric films in a combined RF and arc discharge / V.V. Gasilin, V.V. Kunchenko, Yu.N. Nezovybat’ko, A.V. Taran, V.S. Taran, V.I. Tereshin, O.M. Shvets // Вопросы атомной науки и техники. — 2003. — № 1. — С. 157-159. — Бібліогр.: 3 назв. — англ.

In the presentation we investigate the possibilities to deposit metallic and dielectric films on metal and dielectric materials by means of vacuum technology with application of high frequency (RF) electric fields. As a base-model the device “Bulat-6” was used with proper arc evaporators. The leadin...