Influence of multipolar magnetic field geometry of ECR planar plasma source on plasma parameters

• Published in: Вопросы атомной науки и техники
• Date: 2008
• Main Authors: Fedorchenko, V.D., Chebotarev, V.V., Garkusha, I.E., Medvedev, A.V., Tereshin, V.I., Shevchuk, B.A.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2008
• Subjects: Low temperature plasma and plasma technologies
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/111033
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Influence of multipolar magnetic field geometry of ecr planar plasma source on plasma parameters / V.D. Fedorchenko, V.V. Chebotarev, I.E. Garkusha, A.V. Medvedev, V.I. Tereshin, B.A. Shevchuk // Вопросы атомной науки и техники. — 2008. — № 6. — С. 201-203. — Бібліогр.: 9 назв. — англ.

The plasma parameters and its homogeneity were measured in ECR planar plasma source with multipolar magnetic field, which is created by three parallel magnetic bars of 12 cm in length consisted of set of the permanent magnets of 2 cm length. Geometry of the multipolar magnetic field is able to be ch...