Development of ribbon ion beam source and transport system for industrial applications

• Published in: Вопросы атомной науки и техники
• Date: 2008
• Main Authors: Masunov, E.S., Polozov, S.M., Kulevoy, T.V., Kuibeda, R.P., Pershin, V.I., Petrenko, S.V., Seleznev, D.N., Shamailov, I.M., Sitnikov, A.L.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2008
• Subjects: Физика и техника ускорителей
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/111482
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Development of ribbon ion beam source and transport system for industrial applications / E.S. Masunov, S.M. Polozov, T.V. Kulevoy, R.P. Kuibeda, V.I. Pershin, S.V. Petrenko, D.N. Seleznev, I.M. Shamailov, A.L. Sitnikov // Вопросы атомной науки и техники. — 2008. — № 5. — С. 64-67. — Бібліогр.: 8 назв. — англ.

The design of ribbon ion source and transport system is discussed in this paper. This system is created at ITEP for ion beam implantation in semiconductor technology. The Bernas type ion sources are used for ribbon ion beam production. The periodic system of electrostatic lenses is proposed for inte...