Mass distribution of sputtered cathode material in the reflex discharge along the magnetic field mirror configuration

• Published in: Вопросы атомной науки и техники
• Date: 2016
• Main Authors: Kovtun, Yu.V, Skibenko, E.I., Skibenko, A.I., Kuprin, A.S., Ozerov, A.N., Syusko, E.V., Yuferov, V.B.
• Format: Article
• Language: English
• Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2016
• Subjects: Физика и технология конструкционных материалов
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/111743
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Mass distribution of sputtered cathode material in the reflex discharge along the magnetic field mirror configuration / Yu.V. Kovtun, E.I. Skibenko, A.I. Skibenko, A.S. Kuprin, A.N. Ozerov, E.V. Syus’ko, V.B. Yuferov // Вопросы атомной науки и техники. — 2016. — № 1. — С. 92-98. — Бібліогр.: 20 назв. — рос.

The paper is concerned with the distribution of cathode material sputtered under the action of the pulsed reflex discharge plasma and deposited on the anode surface (vacuum chamber) by means of a set of discrete receiving plates. Correlative relationship has been found between the weight gain increa...