Development of a method of absorbed dose on-line monitoring at product processing by scanned electron beam

The conditions of the contact-free absorbed dose monitoring at industrial product processing by electron beam are investigated. The method is based on analysing the collected charge in a stack monitor (SМ) mounted downstream of irradiated object. Using computer simulation on the basis of a modifie...

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Veröffentlicht in:Вопросы атомной науки и техники
Datum:2016
Hauptverfasser: Pomatsalyuk, R.I., Shevchenko, V.A., Tenishev, A.Eh., Titov, D.V., Uvarov, V.L., Zakharchenko, A.A.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2016
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Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/115369
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Development of a method of absorbed dose on-line monitoring at product processing by scanned electron beam / R.I. Pomatsalyuk, V.A. Shevchenko, A.Eh. Tenishev, D.V. Titov, V.L. Uvarov, A.A. Zakharchenko // Вопросы атомной науки и техники. — 2016. — № 3. — С. 149-153. — Бібліогр.: 9 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine