Local formation of HArF in solid argon: Low-temperature limit and thermal activation
The H + Ar + F reaction leading to HArF formation in an argon matrix is studied at temperatures down to 8 K. The effects of the precursor concentration, deuteration, IR light, and deposition temperature as well as thermal activation of this reaction are studied. It is found that HArF molecules are f...
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| Veröffentlicht in: | Физика низких температур |
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| Datum: | 2010 |
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Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України
2010
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| Zitieren: | Local formation of HArF in solid argon: Low-temperature limit and thermal activation / H. Lignell, L. Khriachtchev, A. Lignell, M. Räsänen // Физика низких температур. — 2010. — Т. 36, № 5. — С. 504-511. — Бібліогр.: 42 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862538812974956544 |
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| author | Lignell, H. Khriachtchev, L. Lignell, A. Räsänen, M. |
| author_facet | Lignell, H. Khriachtchev, L. Lignell, A. Räsänen, M. |
| citation_txt | Local formation of HArF in solid argon: Low-temperature limit and thermal activation / H. Lignell, L. Khriachtchev, A. Lignell, M. Räsänen // Физика низких температур. — 2010. — Т. 36, № 5. — С. 504-511. — Бібліогр.: 42 назв. — англ. |
| collection | DSpace DC |
| container_title | Физика низких температур |
| description | The H + Ar + F reaction leading to HArF formation in an argon matrix is studied at temperatures down to 8 K. The effects of the precursor concentration, deuteration, IR light, and deposition temperature as well as thermal activation of this reaction are studied. It is found that HArF molecules are formed slowly but efficiently at 8 K in a photolyzed HF/Ar matrix, supporting the previously reported results. The formation rate of HArF (and DArF) exhibits a low-temperature limit and enhances at elevated temperatures with activation energy of ca. 40 meV. All the data show that HArF is formed as a result of a local reaction of hydrogen atoms with the parent Ar−F centers and the tunneling mechanism is very probable here. The locality of the precursor photolysis required for this tunneling reaction is consistent with the partial HArF formation observed during photolysis of HF in an argon matrix. The decay mechanism of (ArHAr)⁺ cations is also studied. The present results confirm the previous conclusions that the decay of the cations is not essentially connected to the HArF formation.
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| first_indexed | 2025-11-24T14:42:11Z |
| format | Article |
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| id | nasplib_isofts_kiev_ua-123456789-117039 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 0132-6414 |
| language | English |
| last_indexed | 2025-11-24T14:42:11Z |
| publishDate | 2010 |
| publisher | Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України |
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| spelling | Lignell, H. Khriachtchev, L. Lignell, A. Räsänen, M. 2017-05-19T09:07:26Z 2017-05-19T09:07:26Z 2010 Local formation of HArF in solid argon: Low-temperature limit and thermal activation / H. Lignell, L. Khriachtchev, A. Lignell, M. Räsänen // Физика низких температур. — 2010. — Т. 36, № 5. — С. 504-511. — Бібліогр.: 42 назв. — англ. 0132-6414 PACS: 33.15.–e, 82.33.Pt, 82.50.Hp https://nasplib.isofts.kiev.ua/handle/123456789/117039 The H + Ar + F reaction leading to HArF formation in an argon matrix is studied at temperatures down to 8 K. The effects of the precursor concentration, deuteration, IR light, and deposition temperature as well as thermal activation of this reaction are studied. It is found that HArF molecules are formed slowly but efficiently at 8 K in a photolyzed HF/Ar matrix, supporting the previously reported results. The formation rate of HArF (and DArF) exhibits a low-temperature limit and enhances at elevated temperatures with activation energy of ca. 40 meV. All the data show that HArF is formed as a result of a local reaction of hydrogen atoms with the parent Ar−F centers and the tunneling mechanism is very probable here. The locality of the precursor photolysis required for this tunneling reaction is consistent with the partial HArF formation observed during photolysis of HF in an argon matrix. The decay mechanism of (ArHAr)⁺ cations is also studied. The present results confirm the previous conclusions that the decay of the cations is not essentially connected to the HArF formation. The Academy of Finland supported this work partially through the Finnish Center of Excellence in Computational Molecular Science. H. L. is a member of the graduate school Laskemo (Ministry of Education, Finland). We thank Mika Pettersson for helpful discussions and Toni Nurminen for technical assistance. en Фізико-технічний інститут низьких температур ім. Б.І. Вєркіна НАН України Физика низких температур Nanostructures and Impurity Centers in Cryogenic Environment Local formation of HArF in solid argon: Low-temperature limit and thermal activation Article published earlier |
| spellingShingle | Local formation of HArF in solid argon: Low-temperature limit and thermal activation Lignell, H. Khriachtchev, L. Lignell, A. Räsänen, M. Nanostructures and Impurity Centers in Cryogenic Environment |
| title | Local formation of HArF in solid argon: Low-temperature limit and thermal activation |
| title_full | Local formation of HArF in solid argon: Low-temperature limit and thermal activation |
| title_fullStr | Local formation of HArF in solid argon: Low-temperature limit and thermal activation |
| title_full_unstemmed | Local formation of HArF in solid argon: Low-temperature limit and thermal activation |
| title_short | Local formation of HArF in solid argon: Low-temperature limit and thermal activation |
| title_sort | local formation of harf in solid argon: low-temperature limit and thermal activation |
| topic | Nanostructures and Impurity Centers in Cryogenic Environment |
| topic_facet | Nanostructures and Impurity Centers in Cryogenic Environment |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/117039 |
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