Electrophysical properties of meso-porous silicon free standing films modified with palladium

Resistivity and complex impedance voltage dependences for thick mesoporous
 silicon free layers were studied in this work. The asymmetrical by the sign of
 applied voltage experimental curves at low frequencies have been obtained. Modification
 of electrophysical properties d...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2011
ISSN:1560-8034
Hauptverfasser: Manilov, A.I., Skryshevsky, V.A., Alekseev, S.A., Kuznetsov, G.V.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/117603
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
Beschreibung
Zusammenfassung:Resistivity and complex impedance voltage dependences for thick mesoporous
 silicon free layers were studied in this work. The asymmetrical by the sign of
 applied voltage experimental curves at low frequencies have been obtained. Modification
 of electrophysical properties due to introduction of palladium particles into the porous
 matrix is observed. Impedance change regularities during oxidation of the samples have
 been measured. The explanation of experimental results by asymmetrical distribution of
 charge carrier traps in the bulk of porous silicon has been suggested. Energy band
 diagrams and charge transfer mechanisms of these heterostructures are discussed.
ISSN:1560-8034