Electrophysical properties of meso-porous silicon free standing films modified with palladium

Resistivity and complex impedance voltage dependences for thick mesoporous
 silicon free layers were studied in this work. The asymmetrical by the sign of
 applied voltage experimental curves at low frequencies have been obtained. Modification
 of electrophysical properties d...

Full description

Saved in:
Bibliographic Details
Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2011
Main Authors: Manilov, A.I., Skryshevsky, V.A., Alekseev, S.A., Kuznetsov, G.V.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/117603
Tags: Add Tag
No Tags, Be the first to tag this record!
Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
_version_ 1862632052805861376
author Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
author_facet Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
citation_txt Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Resistivity and complex impedance voltage dependences for thick mesoporous
 silicon free layers were studied in this work. The asymmetrical by the sign of
 applied voltage experimental curves at low frequencies have been obtained. Modification
 of electrophysical properties due to introduction of palladium particles into the porous
 matrix is observed. Impedance change regularities during oxidation of the samples have
 been measured. The explanation of experimental results by asymmetrical distribution of
 charge carrier traps in the bulk of porous silicon has been suggested. Energy band
 diagrams and charge transfer mechanisms of these heterostructures are discussed.
first_indexed 2025-11-30T12:12:28Z
format Article
fulltext
id nasplib_isofts_kiev_ua-123456789-117603
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-30T12:12:28Z
publishDate 2011
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
2017-05-25T15:58:28Z
2017-05-25T15:58:28Z
2011
Electrophysical properties of meso-porous silicon free standing films modified with palladium / A.I. Manilov, V.A. Skryshevsky, S.A. Alekseev, G.V. Kuznetsov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 1-6. — Бібліогр.: 18 назв. — англ.
1560-8034
PACS 61.72.uf, 72.80.Cw, 73.61.Cw
https://nasplib.isofts.kiev.ua/handle/123456789/117603
Resistivity and complex impedance voltage dependences for thick mesoporous
 silicon free layers were studied in this work. The asymmetrical by the sign of
 applied voltage experimental curves at low frequencies have been obtained. Modification
 of electrophysical properties due to introduction of palladium particles into the porous
 matrix is observed. Impedance change regularities during oxidation of the samples have
 been measured. The explanation of experimental results by asymmetrical distribution of
 charge carrier traps in the bulk of porous silicon has been suggested. Energy band
 diagrams and charge transfer mechanisms of these heterostructures are discussed.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Electrophysical properties of meso-porous silicon free standing films modified with palladium
Article
published earlier
spellingShingle Electrophysical properties of meso-porous silicon free standing films modified with palladium
Manilov, A.I.
Skryshevsky, V.A.
Alekseev, S.A.
Kuznetsov, G.V.
title Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_full Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_fullStr Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_full_unstemmed Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_short Electrophysical properties of meso-porous silicon free standing films modified with palladium
title_sort electrophysical properties of meso-porous silicon free standing films modified with palladium
url https://nasplib.isofts.kiev.ua/handle/123456789/117603
work_keys_str_mv AT manilovai electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
AT skryshevskyva electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
AT alekseevsa electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium
AT kuznetsovgv electrophysicalpropertiesofmesoporoussiliconfreestandingfilmsmodifiedwithpalladium