Optical properties of ion implanted thin Ni films on lithium niobate

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 2011
• Main Authors: Lysiuk, V.O., Staschuk, V.S., Androsyuk, I.G., Moskalenko, N.L.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/117623
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Optical properties of ion implanted thin Ni films on lithium niobate / V.O. Lysiuk, V.S. Staschuk, I.G. Androsyuk, N.L. Moskalenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 59-61. — Бібліогр.: 9 назв. — англ.

Ion implantation by keV Ar⁺ ions creates blisters on the surface of thin Ni films deposited on lithium niobate and causes changes in optical properties and structure of Ni film and lithium niobate substrate. Processes of ion implantation and effects of increasing absorption, adhesion, damage thresho...