X-ray study of dopant state in highly doped semiconductor single crystals

Using Si(As, P, B) and GaSb(Si) study, possibilities of X-ray diffraction methods for diagnostics of highly doped semiconductor crystals in characterization of dopant state – whether it is in the crystals in the form of solid solution or under various stages of its decomposition – are shown. The com...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2011
Автори: Shul’pina, I.L., Kyutt, R.N., Ratnikov, V.V., Prokhorov, I.A., Bezbakh, I.Zh., Shcheglov, M.P.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/117624
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:X-ray study of dopant state in highly doped semiconductor single crystals / I.L. Shul’pina, R.N. Kyutt, V.V. Ratnikov, I.A. Prokhorov, I.Zh. Bezbakh, M.P. Shcheglov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 62-70. — Бібліогр.: 27 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-117624
record_format dspace
spelling Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
2017-05-25T17:28:01Z
2017-05-25T17:28:01Z
2011
X-ray study of dopant state in highly doped semiconductor single crystals / I.L. Shul’pina, R.N. Kyutt, V.V. Ratnikov, I.A. Prokhorov, I.Zh. Bezbakh, M.P. Shcheglov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 62-70. — Бібліогр.: 27 назв. — англ.
1560-8034
PACS 61.72.Dd, Ff, Ss; 81.05.Cy, Ea
https://nasplib.isofts.kiev.ua/handle/123456789/117624
Using Si(As, P, B) and GaSb(Si) study, possibilities of X-ray diffraction methods for diagnostics of highly doped semiconductor crystals in characterization of dopant state – whether it is in the crystals in the form of solid solution or under various stages of its decomposition – are shown. The combination of techniques of X-ray diffraction topography and high resolution X-ray diffractometry, higher sensitive to the crystal lattice strain than that traditionally used is taken as the basis for investigating the crystals with slight and strong absorption of X-rays. These methods were supplemented with digital processing of the topographic images of growth striations and electrical measurements.
The work was supported by the Russian Foundation for Basic Research, project no. 06-02-1624 and by the Russian Foundation for Basic Research and the Government of Kaluga region, project no. 09-02-97516.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
X-ray study of dopant state in highly doped semiconductor single crystals
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title X-ray study of dopant state in highly doped semiconductor single crystals
spellingShingle X-ray study of dopant state in highly doped semiconductor single crystals
Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
title_short X-ray study of dopant state in highly doped semiconductor single crystals
title_full X-ray study of dopant state in highly doped semiconductor single crystals
title_fullStr X-ray study of dopant state in highly doped semiconductor single crystals
title_full_unstemmed X-ray study of dopant state in highly doped semiconductor single crystals
title_sort x-ray study of dopant state in highly doped semiconductor single crystals
author Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
author_facet Shul’pina, I.L.
Kyutt, R.N.
Ratnikov, V.V.
Prokhorov, I.A.
Bezbakh, I.Zh.
Shcheglov, M.P.
publishDate 2011
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Using Si(As, P, B) and GaSb(Si) study, possibilities of X-ray diffraction methods for diagnostics of highly doped semiconductor crystals in characterization of dopant state – whether it is in the crystals in the form of solid solution or under various stages of its decomposition – are shown. The combination of techniques of X-ray diffraction topography and high resolution X-ray diffractometry, higher sensitive to the crystal lattice strain than that traditionally used is taken as the basis for investigating the crystals with slight and strong absorption of X-rays. These methods were supplemented with digital processing of the topographic images of growth striations and electrical measurements.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/117624
citation_txt X-ray study of dopant state in highly doped semiconductor single crystals / I.L. Shul’pina, R.N. Kyutt, V.V. Ratnikov, I.A. Prokhorov, I.Zh. Bezbakh, M.P. Shcheglov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 1. — С. 62-70. — Бібліогр.: 27 назв. — англ.
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