The radiation hardness of pulled silicon doped with germanium

The radiation hardness of Czochralski grown n-type silicon samples doped with germanium (NGe = 2×10²⁰ cm⁻³) and without it was investigated after irradiation by fast neutrons. The dependence of the effective carrier concentration on fluence was described in the framework of Gossick’s corrected model...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2007
Автори: Dolgolenko, A.P., Gaidar, G.P., Varentsov, M.D., Litovchenko, P.G.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/117657
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:The radiation hardness of pulled silicon doped with germanium / A.P. Dolgolenko, G.P. Gaidar, M.D. Varentsov, P.G. Litovchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 1. — С. 4-12. — Бібліогр.: 32 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-117657
record_format dspace
spelling Dolgolenko, A.P.
Gaidar, G.P.
Varentsov, M.D.
Litovchenko, P.G.
2017-05-26T05:41:26Z
2017-05-26T05:41:26Z
2007
The radiation hardness of pulled silicon doped with germanium / A.P. Dolgolenko, G.P. Gaidar, M.D. Varentsov, P.G. Litovchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 1. — С. 4-12. — Бібліогр.: 32 назв. — англ.
1560-8034
PACS 61.72.Ji; 61.80.Hg; 61.82.Fk; 71.55.Cn; 61.72.Tt
https://nasplib.isofts.kiev.ua/handle/123456789/117657
The radiation hardness of Czochralski grown n-type silicon samples doped with germanium (NGe = 2×10²⁰ cm⁻³) and without it was investigated after irradiation by fast neutrons. The dependence of the effective carrier concentration on fluence was described in the framework of Gossick’s corrected model. It was found that doping the germanium impurity resulted in increase of n-Si radiation hardness. The isothermal annealing of n-Si 〈Ge〉 after fluence 1.4×10¹⁴ n⁰⋅cm⁻² was studied. It was shown that the annealing of defect clusters is caused by the annihilation of vacancy type defects in clusters with interstitial defects. For di-interstitial (Е₁ = 0.74 eV; ν₁ = 3.5×10⁶s⁻¹), silicon interstitial atom (Е₂ = 0.91 eV; ν₂ = 7×10⁶ s⁻¹) and vacancy (ЕV = 0.8 eV; ν = 1×10⁷s⁻¹) the migration energies and frequency factors were determined. During the storage at room temperature, the behaviour of defect levels Ec−0.17 eV and Ec−0.078 eV was studied in the samples of Si (DOFZ) and Si 〈Ge〉, correspondingly.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
The radiation hardness of pulled silicon doped with germanium
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title The radiation hardness of pulled silicon doped with germanium
spellingShingle The radiation hardness of pulled silicon doped with germanium
Dolgolenko, A.P.
Gaidar, G.P.
Varentsov, M.D.
Litovchenko, P.G.
title_short The radiation hardness of pulled silicon doped with germanium
title_full The radiation hardness of pulled silicon doped with germanium
title_fullStr The radiation hardness of pulled silicon doped with germanium
title_full_unstemmed The radiation hardness of pulled silicon doped with germanium
title_sort radiation hardness of pulled silicon doped with germanium
author Dolgolenko, A.P.
Gaidar, G.P.
Varentsov, M.D.
Litovchenko, P.G.
author_facet Dolgolenko, A.P.
Gaidar, G.P.
Varentsov, M.D.
Litovchenko, P.G.
publishDate 2007
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The radiation hardness of Czochralski grown n-type silicon samples doped with germanium (NGe = 2×10²⁰ cm⁻³) and without it was investigated after irradiation by fast neutrons. The dependence of the effective carrier concentration on fluence was described in the framework of Gossick’s corrected model. It was found that doping the germanium impurity resulted in increase of n-Si radiation hardness. The isothermal annealing of n-Si 〈Ge〉 after fluence 1.4×10¹⁴ n⁰⋅cm⁻² was studied. It was shown that the annealing of defect clusters is caused by the annihilation of vacancy type defects in clusters with interstitial defects. For di-interstitial (Е₁ = 0.74 eV; ν₁ = 3.5×10⁶s⁻¹), silicon interstitial atom (Е₂ = 0.91 eV; ν₂ = 7×10⁶ s⁻¹) and vacancy (ЕV = 0.8 eV; ν = 1×10⁷s⁻¹) the migration energies and frequency factors were determined. During the storage at room temperature, the behaviour of defect levels Ec−0.17 eV and Ec−0.078 eV was studied in the samples of Si (DOFZ) and Si 〈Ge〉, correspondingly.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/117657
citation_txt The radiation hardness of pulled silicon doped with germanium / A.P. Dolgolenko, G.P. Gaidar, M.D. Varentsov, P.G. Litovchenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 1. — С. 4-12. — Бібліогр.: 32 назв. — англ.
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first_indexed 2025-12-07T20:58:17Z
last_indexed 2025-12-07T20:58:17Z
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