Features of piezoresistance in heavily doped n-silicon crystals

It has been shown that in silicon single crystals heavily doped with arsenic the
 presence of the temperature gradient at the interface of the liquid and solid phases in the
 process of growing them from a melt does not lead to anisotropy of piezoresistance under the passing curre...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2013
1. Verfasser: Gaidar, G.P.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2013
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/117668
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Zitieren:Features of piezoresistance in heavily doped n-silicon crystals / G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 1. — С. 80-83. — Бібліогр.: 18 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Gaidar, G.P.
author_facet Gaidar, G.P.
citation_txt Features of piezoresistance in heavily doped n-silicon crystals / G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 1. — С. 80-83. — Бібліогр.: 18 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description It has been shown that in silicon single crystals heavily doped with arsenic the
 presence of the temperature gradient at the interface of the liquid and solid phases in the
 process of growing them from a melt does not lead to anisotropy of piezoresistance under the passing current both along the direction of deforming load (J || X || 111) and
 perpendicularly to it (J ⊥ X || 111). This is considered as an evidence of the dominant
 influence of randomization in spatial distribution of a dopant due to kT (at T = 1685 K)
 during the growth of single crystals.
first_indexed 2025-12-07T15:16:34Z
format Article
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-12-07T15:16:34Z
publishDate 2013
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Gaidar, G.P.
2017-05-26T06:17:42Z
2017-05-26T06:17:42Z
2013
Features of piezoresistance in heavily doped n-silicon crystals / G.P. Gaidar // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 1. — С. 80-83. — Бібліогр.: 18 назв. — англ.
1560-8034
PACS 72.10.-d, 72.20.-I, 72.20.Fr
https://nasplib.isofts.kiev.ua/handle/123456789/117668
It has been shown that in silicon single crystals heavily doped with arsenic the
 presence of the temperature gradient at the interface of the liquid and solid phases in the
 process of growing them from a melt does not lead to anisotropy of piezoresistance under the passing current both along the direction of deforming load (J || X || 111) and
 perpendicularly to it (J ⊥ X || 111). This is considered as an evidence of the dominant
 influence of randomization in spatial distribution of a dopant due to kT (at T = 1685 K)
 during the growth of single crystals.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Features of piezoresistance in heavily doped n-silicon crystals
Article
published earlier
spellingShingle Features of piezoresistance in heavily doped n-silicon crystals
Gaidar, G.P.
title Features of piezoresistance in heavily doped n-silicon crystals
title_full Features of piezoresistance in heavily doped n-silicon crystals
title_fullStr Features of piezoresistance in heavily doped n-silicon crystals
title_full_unstemmed Features of piezoresistance in heavily doped n-silicon crystals
title_short Features of piezoresistance in heavily doped n-silicon crystals
title_sort features of piezoresistance in heavily doped n-silicon crystals
url https://nasplib.isofts.kiev.ua/handle/123456789/117668
work_keys_str_mv AT gaidargp featuresofpiezoresistanceinheavilydopednsiliconcrystals