Yasunas, A., Kotov, D., Shiripov, V., & Radzionay, U. (2013). Low-temperature deposition of silicon dioxide films in high-density plasma. Semiconductor Physics Quantum Electronics & Optoelectronics.
Chicago Style (17th ed.) CitationYasunas, A., D. Kotov, V. Shiripov, and U. Radzionay. "Low-temperature Deposition of Silicon Dioxide Films in High-density Plasma." Semiconductor Physics Quantum Electronics & Optoelectronics 2013.
MLA (8th ed.) CitationYasunas, A., et al. "Low-temperature Deposition of Silicon Dioxide Films in High-density Plasma." Semiconductor Physics Quantum Electronics & Optoelectronics, 2013.
Warning: These citations may not always be 100% accurate.