Bratus, O., Evtukh, A., Lytvyn, O., Voitovych, M., & Yukhymchuk, V. (2011). Structural properties of nanocomposite SiO₂(Si) films obtained by ion-plasma sputtering and thermal annealing. Semiconductor Physics Quantum Electronics & Optoelectronics.
Chicago-Zitierstil (17. Ausg.)Bratus, O.L, A.A Evtukh, O.S Lytvyn, M.V Voitovych, und V.О Yukhymchuk. "Structural Properties of Nanocomposite SiO₂(Si) Films Obtained by Ion-plasma Sputtering and Thermal Annealing." Semiconductor Physics Quantum Electronics & Optoelectronics 2011.
MLA-Zitierstil (8. Ausg.)Bratus, O.L, et al. "Structural Properties of Nanocomposite SiO₂(Si) Films Obtained by Ion-plasma Sputtering and Thermal Annealing." Semiconductor Physics Quantum Electronics & Optoelectronics, 2011.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.