Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN

The temperature dependence of contact resistivity ρс of Ti-Al-TiB₂-Au ohmic
 contacts to n-GaN and effect of microwave treatment on ρс are investigated. The obtained
 dependences are described using a model of current flow via metal shunts associated
 with dislocations, the c...

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Bibliographic Details
Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2013
ISSN:1560-8034
Main Author: Sheremet, V.N.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2013
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/117729
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Effect of microwave treatment on current flow mechanism in
 ohmic contacts to GaN / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 3. — С. 280-284. — Бібліогр.: 14 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Summary:The temperature dependence of contact resistivity ρс of Ti-Al-TiB₂-Au ohmic
 contacts to n-GaN and effect of microwave treatment on ρс are investigated. The obtained
 dependences are described using a model of current flow via metal shunts associated
 with dislocations, the current being limited by diffusion supply of electrons. It is shown
 that microwave treatment increases the dislocation density in the near-contact region of
 contact structure and reduces the relative spread of resistivity values of contacts formed
 on the wafer.
ISSN:1560-8034