Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN

The temperature dependence of contact resistivity ρс of Ti-Al-TiB₂-Au ohmic contacts to n-GaN and effect of microwave treatment on ρс are investigated. The obtained dependences are described using a model of current flow via metal shunts associated with dislocations, the current being limited by...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2013
Main Author: Sheremet, V.N.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2013
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/117729
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 3. — С. 280-284. — Бібліогр.: 14 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-117729
record_format dspace
spelling Sheremet, V.N.
2017-05-26T13:45:57Z
2017-05-26T13:45:57Z
2013
Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 3. — С. 280-284. — Бібліогр.: 14 назв. — англ.
1560-8034
PACS 73.40.Cg, Ns; 85.40.-e
https://nasplib.isofts.kiev.ua/handle/123456789/117729
The temperature dependence of contact resistivity ρс of Ti-Al-TiB₂-Au ohmic contacts to n-GaN and effect of microwave treatment on ρс are investigated. The obtained dependences are described using a model of current flow via metal shunts associated with dislocations, the current being limited by diffusion supply of electrons. It is shown that microwave treatment increases the dislocation density in the near-contact region of contact structure and reduces the relative spread of resistivity values of contacts formed on the wafer.
The author is indebted to research workers of the V. Lashkaryov Institute of Semiconductor Physics of the National Academy of Sciences of Ukraine – Prof. R.V. Konakova, Prof. A.V. Sachenko, Prof. L.A. Matveeva, Dr. V.G. Lyapin for fruitful consultations and interest in this work and researcher E.Yu. Kolyadina for measurement of radii of curvatures of the samples.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
spellingShingle Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
Sheremet, V.N.
title_short Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
title_full Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
title_fullStr Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
title_full_unstemmed Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN
title_sort effect of microwave treatment on current flow mechanism in ohmic contacts to gan
author Sheremet, V.N.
author_facet Sheremet, V.N.
publishDate 2013
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description The temperature dependence of contact resistivity ρс of Ti-Al-TiB₂-Au ohmic contacts to n-GaN and effect of microwave treatment on ρс are investigated. The obtained dependences are described using a model of current flow via metal shunts associated with dislocations, the current being limited by diffusion supply of electrons. It is shown that microwave treatment increases the dislocation density in the near-contact region of contact structure and reduces the relative spread of resistivity values of contacts formed on the wafer.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/117729
citation_txt Effect of microwave treatment on current flow mechanism in ohmic contacts to GaN / V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2013. — Т. 16, № 3. — С. 280-284. — Бібліогр.: 14 назв. — англ.
work_keys_str_mv AT sheremetvn effectofmicrowavetreatmentoncurrentflowmechanisminohmiccontactstogan
first_indexed 2025-12-07T15:48:15Z
last_indexed 2025-12-07T15:48:15Z
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