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Graded refraction index antireflection coatings based on silicon and titanium oxides

Thin films with a graded refraction index constituted from silicon and titanium oxides were deposited by plasma enhanced chemical vapor deposition using electron cyclotron resonance. A plasma of oxygen reacted with two precursors: the tetraethoxysilane (TEOS) and the titan...

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Bibliographic Details
Published in:	Semiconductor Physics Quantum Electronics & Optoelectronics
Date:	2007
Main Author:	Abdelhakim Mahdjoub
Format:	Article
Language:	English
Published:	Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Online Access:	https://nasplib.isofts.kiev.ua/handle/123456789/117776
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Journal Title:	Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:	Graded refraction index antireflection coatings based on silicon and titanium oxides / Abdelhakim Mahdjoub // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 1. — С. 60-66. — Бібліогр.: 31 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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