On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step

• Опубліковано в: : Semiconductor Physics Quantum Electronics & Optoelectronics
• Дата: 2014
• Автори: Sachenko, A.V., Belyaev, A.E., Boltovets, N.S., Vinogradov, A.O., Pilipenko, V.A., Petlitskaya, T.V., Anischik, V.M., Konakova, R.V., Korostinskaya, T.V., Kostylyov, V.P., Kudryk, Ya.Ya., Lyapin, V.G., Romanets, P.N., Sheremet, V.N.
• Формат: Стаття
• Мова: English
• Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
• Онлайн доступ: https://nasplib.isofts.kiev.ua/handle/123456789/117786
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Цитувати: On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step / A.V. Sachenko, A.E. Belyaev, N.S. Boltovets, A.O. Vinogradov, V.A. Pilipenko, T.V. Petlitskaya, V.M. Anischik, R.V. Konakova, T.V. Korostinskaya, V.P. Kostylyov, Ya.Ya. Kudryk, V.G. Lyapin, P.N. Romanets, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 1-6. — Бібліогр.: 15 назв. — англ.

We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) for ohmic contacts to the silicon n⁺ -n-structures whose n⁺ -layer was formed using phosphorus diffusion or ion implantation. The ρс(Т) dependence was measured in the 125–375 K temperature range with the transmission line method, with allowance made for conduction in both the n⁺ -layer and n⁺ -n doping step.