On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step

We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) for ohmic contacts to the silicon n⁺ -n-structures whose n⁺ -layer was formed using phosphorus diffusion or ion implantation. The ρс(Т) dependence was measured in the 125–375 K temperature range wi...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2014
Автори: Sachenko, A.V., Belyaev, A.E., Boltovets, N.S., Vinogradov, A.O., Pilipenko, V.A., Petlitskaya, T.V., Anischik, V.M., Konakova, R.V., Korostinskaya, T.V., Kostylyov, V.P., Kudryk, Ya.Ya., Lyapin, V.G., Romanets, P.N., Sheremet, V.N.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/117786
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step / A.V. Sachenko, A.E. Belyaev, N.S. Boltovets, A.O. Vinogradov, V.A. Pilipenko, T.V. Petlitskaya, V.M. Anischik, R.V. Konakova, T.V. Korostinskaya, V.P. Kostylyov, Ya.Ya. Kudryk, V.G. Lyapin, P.N. Romanets, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 1-6. — Бібліогр.: 15 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-117786
record_format dspace
spelling Sachenko, A.V.
Belyaev, A.E.
Boltovets, N.S.
Vinogradov, A.O.
Pilipenko, V.A.
Petlitskaya, T.V.
Anischik, V.M.
Konakova, R.V.
Korostinskaya, T.V.
Kostylyov, V.P.
Kudryk, Ya.Ya.
Lyapin, V.G.
Romanets, P.N.
Sheremet, V.N.
2017-05-26T17:38:55Z
2017-05-26T17:38:55Z
2014
On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step / A.V. Sachenko, A.E. Belyaev, N.S. Boltovets, A.O. Vinogradov, V.A. Pilipenko, T.V. Petlitskaya, V.M. Anischik, R.V. Konakova, T.V. Korostinskaya, V.P. Kostylyov, Ya.Ya. Kudryk, V.G. Lyapin, P.N. Romanets, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 1-6. — Бібліогр.: 15 назв. — англ.
1560-8034
PACS 73.40.Ns, 73.40.Cg, 85.40.-e
https://nasplib.isofts.kiev.ua/handle/123456789/117786
We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) for ohmic contacts to the silicon n⁺ -n-structures whose n⁺ -layer was formed using phosphorus diffusion or ion implantation. The ρс(Т) dependence was measured in the 125–375 K temperature range with the transmission line method, with allowance made for conduction in both the n⁺ -layer and n⁺ -n doping step.
The work was supported by the Project №Ф54/209- 2013 ДФФД–БРФФД–2013.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
spellingShingle On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
Sachenko, A.V.
Belyaev, A.E.
Boltovets, N.S.
Vinogradov, A.O.
Pilipenko, V.A.
Petlitskaya, T.V.
Anischik, V.M.
Konakova, R.V.
Korostinskaya, T.V.
Kostylyov, V.P.
Kudryk, Ya.Ya.
Lyapin, V.G.
Romanets, P.N.
Sheremet, V.N.
title_short On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
title_full On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
title_fullStr On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
title_full_unstemmed On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step
title_sort on a feature of temperature dependence of contact resistivity for ohmic contacts to n-si with an n⁺ -n doping step
author Sachenko, A.V.
Belyaev, A.E.
Boltovets, N.S.
Vinogradov, A.O.
Pilipenko, V.A.
Petlitskaya, T.V.
Anischik, V.M.
Konakova, R.V.
Korostinskaya, T.V.
Kostylyov, V.P.
Kudryk, Ya.Ya.
Lyapin, V.G.
Romanets, P.N.
Sheremet, V.N.
author_facet Sachenko, A.V.
Belyaev, A.E.
Boltovets, N.S.
Vinogradov, A.O.
Pilipenko, V.A.
Petlitskaya, T.V.
Anischik, V.M.
Konakova, R.V.
Korostinskaya, T.V.
Kostylyov, V.P.
Kudryk, Ya.Ya.
Lyapin, V.G.
Romanets, P.N.
Sheremet, V.N.
publishDate 2014
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) for ohmic contacts to the silicon n⁺ -n-structures whose n⁺ -layer was formed using phosphorus diffusion or ion implantation. The ρс(Т) dependence was measured in the 125–375 K temperature range with the transmission line method, with allowance made for conduction in both the n⁺ -layer and n⁺ -n doping step.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/117786
citation_txt On a feature of temperature dependence of contact resistivity for ohmic contacts to n-Si with an n⁺ -n doping step / A.V. Sachenko, A.E. Belyaev, N.S. Boltovets, A.O. Vinogradov, V.A. Pilipenko, T.V. Petlitskaya, V.M. Anischik, R.V. Konakova, T.V. Korostinskaya, V.P. Kostylyov, Ya.Ya. Kudryk, V.G. Lyapin, P.N. Romanets, V.N. Sheremet // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 1-6. — Бібліогр.: 15 назв. — англ.
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first_indexed 2025-12-07T18:38:58Z
last_indexed 2025-12-07T18:38:58Z
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