Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
The envelope method was used to determine optical constants of TiO₂ thin
 films deposited by DC reactive magnetron sputtering and electron-beam evaporation
 techniques. The density and thickness of the thin films were calculated. Optical
 properties of the TiO₂ thin films wer...
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| Опубліковано в: : | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Дата: | 2011 |
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2011
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| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/117790 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862539842140766208 |
|---|---|
| author | Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. |
| author_facet | Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. |
| citation_txt | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | The envelope method was used to determine optical constants of TiO₂ thin
films deposited by DC reactive magnetron sputtering and electron-beam evaporation
techniques. The density and thickness of the thin films were calculated. Optical
properties of the TiO₂ thin films were strongly dependent on the deposition technology.
The TiO₂ thin films prepared by magnetron sputtering and electron-beam evaporation
methods were established to be indirect band semiconductors with the band gap energies
3.15 and 3.43 eV, respectively.
|
| first_indexed | 2025-11-24T15:46:51Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-117790 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-11-24T15:46:51Z |
| publishDate | 2011 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. 2017-05-26T17:41:22Z 2017-05-26T17:41:22Z 2011 Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ. 1560-8034 PACS 78.66.-w, 81.15.Cd, Dj https://nasplib.isofts.kiev.ua/handle/123456789/117790 The envelope method was used to determine optical constants of TiO₂ thin
 films deposited by DC reactive magnetron sputtering and electron-beam evaporation
 techniques. The density and thickness of the thin films were calculated. Optical
 properties of the TiO₂ thin films were strongly dependent on the deposition technology.
 The TiO₂ thin films prepared by magnetron sputtering and electron-beam evaporation
 methods were established to be indirect band semiconductors with the band gap energies
 3.15 and 3.43 eV, respectively. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques Article published earlier |
| spellingShingle | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques Brus, V.V. Kovalyuk, Z.D. Parfenyuk, O.A. Vakhnyak, N.D. |
| title | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_full | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_fullStr | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_full_unstemmed | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_short | Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| title_sort | comparison of optical properties of tio₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/117790 |
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