Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques

• Date: 2011
• Main Authors: Brus, V.V., Kovalyuk, Z.D., Parfenyuk, O.A., Vakhnyak, N.D.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2011
• Series: Semiconductor Physics Quantum Electronics & Optoelectronics
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/117790
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / V.V. Brus, Z.D. Kovalyuk, O.A. Parfenyuk, N.D. Vakhnyak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2011. — Т. 14, № 4. — С. 427-431. — Бібліогр.: 12 назв. — англ.

The envelope method was used to determine optical constants of TiO₂ thin films deposited by DC reactive magnetron sputtering and electron-beam evaporation techniques. The density and thickness of the thin films were calculated. Optical properties of the TiO₂ thin films were strongly dependent on...