Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions

Bubble-like and crater-like blisters were observed at the boundaries of the
 structures “thin Ni film–lithium niobate” and “thin Pd film–lithium tantalate” implanted
 by Ar⁺
 ions. Analyses of these systems by AFM and SEM have shown that ion
 implantation essentially...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2010
Main Authors: Lysiuk, V.O., Moskalenko, N.L., Staschuk, V.S., Kluy, M.I., Vakulenko, O.V., Androsyuk, I.G., Surmach, M.A., Pogoda, V.I.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2010
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/117822
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Cite this:Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions / V.O. Lysiuk, N.L. Moskalenko, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, I.G. Androsyuk, M.A. Surmach, V.I. Pogoda // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 1. — С. 103-109. — Бібліогр.: 10 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Lysiuk, V.O.
Moskalenko, N.L.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Androsyuk, I.G.
Surmach, M.A.
Pogoda, V.I.
author_facet Lysiuk, V.O.
Moskalenko, N.L.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Androsyuk, I.G.
Surmach, M.A.
Pogoda, V.I.
citation_txt Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions / V.O. Lysiuk, N.L. Moskalenko, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, I.G. Androsyuk, M.A. Surmach, V.I. Pogoda // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 1. — С. 103-109. — Бібліогр.: 10 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description Bubble-like and crater-like blisters were observed at the boundaries of the
 structures “thin Ni film–lithium niobate” and “thin Pd film–lithium tantalate” implanted
 by Ar⁺
 ions. Analyses of these systems by AFM and SEM have shown that ion
 implantation essentially modifies near-surface structures with changing their optical,
 electrical and mechanical properties. Differences in the optical properties and surface
 structure between implanted and non-implanted systems are observed and explained by
 different properties of materials, widening interface “film–substrate” as well as by other
 known effects and phenomena. Enhanced adhesion of these films to substrate,
 nonselective spectral response is a base for effective and perspective application of the
 systems in development of high-sensitive pyroelectric detectors with a wide spectral
 range and high optical damage threshold.
first_indexed 2025-11-26T21:25:33Z
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language English
last_indexed 2025-11-26T21:25:33Z
publishDate 2010
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Lysiuk, V.O.
Moskalenko, N.L.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Androsyuk, I.G.
Surmach, M.A.
Pogoda, V.I.
2017-05-26T19:03:21Z
2017-05-26T19:03:21Z
2010
Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions / V.O. Lysiuk, N.L. Moskalenko, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, I.G. Androsyuk, M.A. Surmach, V.I. Pogoda // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 1. — С. 103-109. — Бібліогр.: 10 назв. — англ.
1560-8034
PACS 68.55.Ln, 85.60.Gz
https://nasplib.isofts.kiev.ua/handle/123456789/117822
Bubble-like and crater-like blisters were observed at the boundaries of the
 structures “thin Ni film–lithium niobate” and “thin Pd film–lithium tantalate” implanted
 by Ar⁺
 ions. Analyses of these systems by AFM and SEM have shown that ion
 implantation essentially modifies near-surface structures with changing their optical,
 electrical and mechanical properties. Differences in the optical properties and surface
 structure between implanted and non-implanted systems are observed and explained by
 different properties of materials, widening interface “film–substrate” as well as by other
 known effects and phenomena. Enhanced adhesion of these films to substrate,
 nonselective spectral response is a base for effective and perspective application of the
 systems in development of high-sensitive pyroelectric detectors with a wide spectral
 range and high optical damage threshold.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
Article
published earlier
spellingShingle Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
Lysiuk, V.O.
Moskalenko, N.L.
Staschuk, V.S.
Kluy, M.I.
Vakulenko, O.V.
Androsyuk, I.G.
Surmach, M.A.
Pogoda, V.I.
title Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
title_full Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
title_fullStr Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
title_full_unstemmed Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
title_short Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions
title_sort formation of blisters in thin metal films on lithium niobate implanted by kev ar⁺ ions
url https://nasplib.isofts.kiev.ua/handle/123456789/117822
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