Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 2010
• Hauptverfasser: Lysiuk, V.O., Moskalenko, N.L., Staschuk, V.S., Kluy, M.I., Vakulenko, O.V., Androsyuk, I.G., Surmach, M.A., Pogoda, V.I.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2010
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/117822
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Formation of blisters in thin metal films on lithium niobate implanted by keV Ar⁺ ions / V.O. Lysiuk, N.L. Moskalenko, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, I.G. Androsyuk, M.A. Surmach, V.I. Pogoda // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 1. — С. 103-109. — Бібліогр.: 10 назв. — англ.

Bubble-like and crater-like blisters were observed at the boundaries of the structures “thin Ni film–lithium niobate” and “thin Pd film–lithium tantalate” implanted by Ar⁺ ions. Analyses of these systems by AFM and SEM have shown that ion implantation essentially modifies near-surface structure...