High-temperature configurations of dimers in Si (001) surface layers

Molecular Dynamics (MD) simulation of Si (001) surface layers was performed. In the modified algorithm of MD the potential is corrected on each step of calculation. The corrections account the re-hybridization of chemical bonds in relaxation processes. It was found that the high-temperature relaxati...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2003
Hauptverfasser: Kiv, A.E., Maksymova, T.I., Moiseenko, N.V., Soloviev, V.N.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/117867
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:High-temperature configurations of dimers in Si (001) surface layers / A.E. Kiv, T.I. Maksymova, N.V. Moiseenko, V.N. Soloviev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 14-18. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-117867
record_format dspace
spelling Kiv, A.E.
Maksymova, T.I.
Moiseenko, N.V.
Soloviev, V.N.
2017-05-27T09:57:33Z
2017-05-27T09:57:33Z
2003
High-temperature configurations of dimers in Si (001) surface layers / A.E. Kiv, T.I. Maksymova, N.V. Moiseenko, V.N. Soloviev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 14-18. — Бібліогр.: 13 назв. — англ.
1560-8034
PACS: 68.35.Bs
PACS: 71.15.Pd
https://nasplib.isofts.kiev.ua/handle/123456789/117867
Molecular Dynamics (MD) simulation of Si (001) surface layers was performed. In the modified algorithm of MD the potential is corrected on each step of calculation. The corrections account the re-hybridization of chemical bonds in relaxation processes. It was found that the high-temperature relaxation of Si surface layers leads to formation of Quasi-Disordered Phase (QDP). QDP is spread from the first layer up to the forth-fifth layer. In all these layers dimers are formed. Their characteristics (length distribution and space orientation) change from layer to layer. They differ significantly from dimers formed at lower temperatures.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
High-temperature configurations of dimers in Si (001) surface layers
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title High-temperature configurations of dimers in Si (001) surface layers
spellingShingle High-temperature configurations of dimers in Si (001) surface layers
Kiv, A.E.
Maksymova, T.I.
Moiseenko, N.V.
Soloviev, V.N.
title_short High-temperature configurations of dimers in Si (001) surface layers
title_full High-temperature configurations of dimers in Si (001) surface layers
title_fullStr High-temperature configurations of dimers in Si (001) surface layers
title_full_unstemmed High-temperature configurations of dimers in Si (001) surface layers
title_sort high-temperature configurations of dimers in si (001) surface layers
author Kiv, A.E.
Maksymova, T.I.
Moiseenko, N.V.
Soloviev, V.N.
author_facet Kiv, A.E.
Maksymova, T.I.
Moiseenko, N.V.
Soloviev, V.N.
publishDate 2003
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Molecular Dynamics (MD) simulation of Si (001) surface layers was performed. In the modified algorithm of MD the potential is corrected on each step of calculation. The corrections account the re-hybridization of chemical bonds in relaxation processes. It was found that the high-temperature relaxation of Si surface layers leads to formation of Quasi-Disordered Phase (QDP). QDP is spread from the first layer up to the forth-fifth layer. In all these layers dimers are formed. Their characteristics (length distribution and space orientation) change from layer to layer. They differ significantly from dimers formed at lower temperatures.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/117867
citation_txt High-temperature configurations of dimers in Si (001) surface layers / A.E. Kiv, T.I. Maksymova, N.V. Moiseenko, V.N. Soloviev // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 14-18. — Бібліогр.: 13 назв. — англ.
work_keys_str_mv AT kivae hightemperatureconfigurationsofdimersinsi001surfacelayers
AT maksymovati hightemperatureconfigurationsofdimersinsi001surfacelayers
AT moiseenkonv hightemperatureconfigurationsofdimersinsi001surfacelayers
AT solovievvn hightemperatureconfigurationsofdimersinsi001surfacelayers
first_indexed 2025-12-07T16:37:07Z
last_indexed 2025-12-07T16:37:07Z
_version_ 1850868160443449344