Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 2007
• ISSN: 1560-8034
• Hauptverfasser: Dmitruk, N.L., Mayeva, O.I., Korovin, A.V., Mamykin, S.V., Sosnova, M.V., Yastrubchak, O.B.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/117917
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics / N.L. Dmitruk, O.I. Mayeva, A.V. Korovin, S.V. Mamykin, M.V. Sosnova, O.B. Yastrubchak // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 62-71. — Бібліогр.: 30 назв. — англ.

The optical properties of multilayer structures consisting of dielectric,
 conductivity-oxide and nanoscaled metal layers, deposited on the planar substrates
 (witness samples) and surface relief ones (diffraction gratings) with micro- and nanoscale
 sizes, are investigated by AFM, spectral ellipsometry (SE), and photometric techniques.
 The SE-measured parameters are related to actual characteristics of the layers when
 specified the model of their near-surface regions. Using a parametrization of the layer
 dielectric function versus the wavelength and a fitting procedure, the dielectric
 parameters are determined. It is shown that the optical constants are affected by both the
 substrate morphology and the adjacent medium. Preliminary data about the influence of
 isolated particle plasmon excitations in 2D-substrates with the top nanoscaled Au layer
 on its optical properties are presented.