Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate

• Veröffentlicht in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Datum: 2007
• Hauptverfasser: Lysiuk, V.O., Staschuk, V.S., Kluy, M.I., Vakulenko, O.V., Poperenko, L.V.
• Format: Artikel
• Sprache: Englisch
• Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
• Online Zugang: https://nasplib.isofts.kiev.ua/handle/123456789/117919
• Назва журналу: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Zitieren: Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate / V.O. Lysiuk, V.S. Staschuk, M.I. Kluy, O.V. Vakulenko, L.V. Poperenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 2. — С. 76-80. — Бібліогр.: 13 назв. — англ.

The systems “thin Ni film – lithium niobate” and “thin Pd film – lithium
 tantalate” are implanted by Ar⁺ ions with an energy of 100 keV and a dose of 10¹⁶ cm⁻².
 Analyses of the systems by AFM and SEM have shown that the ion implantation
 essentially modifies the near-surface structure resulting in a change of its optical,
 electrical, and mechanical properties. Strong difference in the near-surface structures
 between implanted systems with Ni or Pd thin films is observed. Such a difference is
 explained by the heterogeneity of an ion beam and different properties of the materials.
 The application to the development of high-sensitive pyroelectric detectors with high
 damage threshold is proposed.