Thermoelasticity in Ge due to nonuniform distribution of doping impurity studied by light polarization modulation technique

Volume-gradient photovoltage and birefrigence caused by a difference of main mechanical stress components have been studied in the Ge-monocrystal with step-like distribution of the doping impurity concentration, N. The qualitative agreement between the function obtained by integration of the spatial...

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Date:1999
Main Authors: Serdega, B.K., Venger, Ye.F., Nikitenko, Ye.V.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 1999
Series:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/117956
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Thermoelasticity in Ge due to nonuniform distribution of doping impurity studied by light polarization modulation technique / B.K. Serdega, Ye.F. Venger, Ye.V. Nikitenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 1. — С. 153-156. — Бібліогр.: 7 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Summary:Volume-gradient photovoltage and birefrigence caused by a difference of main mechanical stress components have been studied in the Ge-monocrystal with step-like distribution of the doping impurity concentration, N. The qualitative agreement between the function obtained by integration of the spatial dependence of the anisotropy and of the coordinate dependence of the photovoltage was observed. Using this fact, the conclusion is made that the features of thermoelastic mechanical stress can be distribution of expressed by the dependence |σz - σy| ~ d²N/dz². Remove selected