Origin of surface layer on common substrates for functional material films probed by ellipsometry

A multiple angle ellipsometric method is used to investigate thin film layers on common substrates (gadolinium gallium garnet-GGG, sapphire-Al₂O₃, and glass ceramic sitall) for functional material films. The method evaluates fundamental optical constants and thicknesses of the layers. Dielectric fun...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2003
Автори: Belyaeva, A.I., Galuza, A.A., Kudlenko, A.D.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/117962
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Origin of surface layer on common substrates for functional material films probed by ellipsometry / A.I. Belyaeva, A.A. Galuza, A.D. Kudlenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 81-85. — Бібліогр.: 8 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-117962
record_format dspace
spelling Belyaeva, A.I.
Galuza, A.A.
Kudlenko, A.D.
2017-05-27T18:06:53Z
2017-05-27T18:06:53Z
2003
Origin of surface layer on common substrates for functional material films probed by ellipsometry / A.I. Belyaeva, A.A. Galuza, A.D. Kudlenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 81-85. — Бібліогр.: 8 назв. — англ.
1560-8034
PACS: 68.35.-p, 78.68.+m
https://nasplib.isofts.kiev.ua/handle/123456789/117962
A multiple angle ellipsometric method is used to investigate thin film layers on common substrates (gadolinium gallium garnet-GGG, sapphire-Al₂O₃, and glass ceramic sitall) for functional material films. The method evaluates fundamental optical constants and thicknesses of the layers. Dielectric functions for the surface layers on such kind of plates have been determined. Coincidence up to the third decimal point in refractive index value (nf) was shown. Errors for the thickness of surface layer (df) is not more than 3 %. It is shown that the dielectric properties of microscopically rough layers of thickness ~10-45 nm can be accurately modeled in the homogeneous thin layer approximation. The thickness and origin of the surface layer on substrates are found out. Experimental data analysis allows to make some conclusions concerning the origin of this layer. It is a specific amorphous damaged layer that remains after taking out stressed surface layer via chemical polishing. The corrosion processes on glass ceramic seems to be very similar to those occurring on GGG and sapphire single crystals.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Origin of surface layer on common substrates for functional material films probed by ellipsometry
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Origin of surface layer on common substrates for functional material films probed by ellipsometry
spellingShingle Origin of surface layer on common substrates for functional material films probed by ellipsometry
Belyaeva, A.I.
Galuza, A.A.
Kudlenko, A.D.
title_short Origin of surface layer on common substrates for functional material films probed by ellipsometry
title_full Origin of surface layer on common substrates for functional material films probed by ellipsometry
title_fullStr Origin of surface layer on common substrates for functional material films probed by ellipsometry
title_full_unstemmed Origin of surface layer on common substrates for functional material films probed by ellipsometry
title_sort origin of surface layer on common substrates for functional material films probed by ellipsometry
author Belyaeva, A.I.
Galuza, A.A.
Kudlenko, A.D.
author_facet Belyaeva, A.I.
Galuza, A.A.
Kudlenko, A.D.
publishDate 2003
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description A multiple angle ellipsometric method is used to investigate thin film layers on common substrates (gadolinium gallium garnet-GGG, sapphire-Al₂O₃, and glass ceramic sitall) for functional material films. The method evaluates fundamental optical constants and thicknesses of the layers. Dielectric functions for the surface layers on such kind of plates have been determined. Coincidence up to the third decimal point in refractive index value (nf) was shown. Errors for the thickness of surface layer (df) is not more than 3 %. It is shown that the dielectric properties of microscopically rough layers of thickness ~10-45 nm can be accurately modeled in the homogeneous thin layer approximation. The thickness and origin of the surface layer on substrates are found out. Experimental data analysis allows to make some conclusions concerning the origin of this layer. It is a specific amorphous damaged layer that remains after taking out stressed surface layer via chemical polishing. The corrosion processes on glass ceramic seems to be very similar to those occurring on GGG and sapphire single crystals.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/117962
citation_txt Origin of surface layer on common substrates for functional material films probed by ellipsometry / A.I. Belyaeva, A.A. Galuza, A.D. Kudlenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 1. — С. 81-85. — Бібліогр.: 8 назв. — англ.
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