Structure and luminescence study of nanoporous silicon layers with high internal surface

In this work, the technique of formation of homogeneous nanoporous silicon layers with high internal surface on solar cell substrates by stain etching is developed. Emission and structure properties of such layers were studied by photoluminescence (PL), photoluminescence excitation, Auger electronic...

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Опубліковано в: :Semiconductor Physics Quantum Electronics & Optoelectronics
Дата:2003
Автори: Makara, V.A., Melnichenko, M.M., Svezhentsova, K.V., Khomenkova, L.Yu., Shmyryeva, O.M.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2003
Онлайн доступ:https://nasplib.isofts.kiev.ua/handle/123456789/118088
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Structure and luminescence study of nanoporous silicon layers with high internal surface / V.A. Makara, M.M. Melnichenko, K.V. Svezhentsova, L.Yu. Khomenkova, O.M. Shmyryeva // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 492-495. — Бібліогр.: 9 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118088
record_format dspace
spelling Makara, V.A.
Melnichenko, M.M.
Svezhentsova, K.V.
Khomenkova, L.Yu.
Shmyryeva, O.M.
2017-05-28T16:44:51Z
2017-05-28T16:44:51Z
2003
Structure and luminescence study of nanoporous silicon layers with high internal surface / V.A. Makara, M.M. Melnichenko, K.V. Svezhentsova, L.Yu. Khomenkova, O.M. Shmyryeva // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 492-495. — Бібліогр.: 9 назв. — англ.
1560-8034
PACS: 78.55.Mb, 78.66.Bf
https://nasplib.isofts.kiev.ua/handle/123456789/118088
In this work, the technique of formation of homogeneous nanoporous silicon layers with high internal surface on solar cell substrates by stain etching is developed. Emission and structure properties of such layers were studied by photoluminescence (PL), photoluminescence excitation, Auger electronic spectroscopy, atomic force microscopy and scanning tunnel microscopy methods. It was observed that nanoporous layers are of high homogeneity and their thickness is ~20-25 nm. It was shown that the higher PL intensity of such layers in comparison with PL intensity of the layers prepared on standard substrates in the same regimes is connected with the higher internal surface. The increase of PL intensity during prolonged aging in air at the room temperature was observed.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Structure and luminescence study of nanoporous silicon layers with high internal surface
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Structure and luminescence study of nanoporous silicon layers with high internal surface
spellingShingle Structure and luminescence study of nanoporous silicon layers with high internal surface
Makara, V.A.
Melnichenko, M.M.
Svezhentsova, K.V.
Khomenkova, L.Yu.
Shmyryeva, O.M.
title_short Structure and luminescence study of nanoporous silicon layers with high internal surface
title_full Structure and luminescence study of nanoporous silicon layers with high internal surface
title_fullStr Structure and luminescence study of nanoporous silicon layers with high internal surface
title_full_unstemmed Structure and luminescence study of nanoporous silicon layers with high internal surface
title_sort structure and luminescence study of nanoporous silicon layers with high internal surface
author Makara, V.A.
Melnichenko, M.M.
Svezhentsova, K.V.
Khomenkova, L.Yu.
Shmyryeva, O.M.
author_facet Makara, V.A.
Melnichenko, M.M.
Svezhentsova, K.V.
Khomenkova, L.Yu.
Shmyryeva, O.M.
publishDate 2003
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description In this work, the technique of formation of homogeneous nanoporous silicon layers with high internal surface on solar cell substrates by stain etching is developed. Emission and structure properties of such layers were studied by photoluminescence (PL), photoluminescence excitation, Auger electronic spectroscopy, atomic force microscopy and scanning tunnel microscopy methods. It was observed that nanoporous layers are of high homogeneity and their thickness is ~20-25 nm. It was shown that the higher PL intensity of such layers in comparison with PL intensity of the layers prepared on standard substrates in the same regimes is connected with the higher internal surface. The increase of PL intensity during prolonged aging in air at the room temperature was observed.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118088
citation_txt Structure and luminescence study of nanoporous silicon layers with high internal surface / V.A. Makara, M.M. Melnichenko, K.V. Svezhentsova, L.Yu. Khomenkova, O.M. Shmyryeva // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 492-495. — Бібліогр.: 9 назв. — англ.
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