Vacuum method for creation of liquid crystal orienting microrelief
A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of th...
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| Published in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Date: | 2003 |
| Main Authors: | , , , , |
| Format: | Article |
| Language: | English |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2003
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| Online Access: | https://nasplib.isofts.kiev.ua/handle/123456789/118102 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
nasplib_isofts_kiev_ua-123456789-118102 |
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Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. 2017-05-28T17:10:54Z 2017-05-28T17:10:54Z 2003 Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. 1560-8034 PACS: 42.79.Kr https://nasplib.isofts.kiev.ua/handle/123456789/118102 A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Vacuum method for creation of liquid crystal orienting microrelief Article published earlier |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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DSpace DC |
| title |
Vacuum method for creation of liquid crystal orienting microrelief |
| spellingShingle |
Vacuum method for creation of liquid crystal orienting microrelief Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| title_short |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_full |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_fullStr |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_full_unstemmed |
Vacuum method for creation of liquid crystal orienting microrelief |
| title_sort |
vacuum method for creation of liquid crystal orienting microrelief |
| author |
Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| author_facet |
Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| publishDate |
2003 |
| language |
English |
| container_title |
Semiconductor Physics Quantum Electronics & Optoelectronics |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| format |
Article |
| description |
A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated.
|
| issn |
1560-8034 |
| url |
https://nasplib.isofts.kiev.ua/handle/123456789/118102 |
| citation_txt |
Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. |
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AT kolomzarovyu vacuummethodforcreationofliquidcrystalorientingmicrorelief AT oleksenkop vacuummethodforcreationofliquidcrystalorientingmicrorelief AT sorokinv vacuummethodforcreationofliquidcrystalorientingmicrorelief AT tytarenkop vacuummethodforcreationofliquidcrystalorientingmicrorelief AT zelinskyyr vacuummethodforcreationofliquidcrystalorientingmicrorelief |
| first_indexed |
2025-11-28T09:23:22Z |
| last_indexed |
2025-11-28T09:23:22Z |
| _version_ |
1850853475715383296 |