Vacuum method for creation of liquid crystal orienting microrelief
A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of th...
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| Опубліковано в: : | Semiconductor Physics Quantum Electronics & Optoelectronics |
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| Дата: | 2003 |
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2003
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| Онлайн доступ: | https://nasplib.isofts.kiev.ua/handle/123456789/118102 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862604403003883520 |
|---|---|
| author | Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| author_facet | Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| citation_txt | Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated.
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| first_indexed | 2025-11-28T09:23:22Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-118102 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-11-28T09:23:22Z |
| publishDate | 2003 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. 2017-05-28T17:10:54Z 2017-05-28T17:10:54Z 2003 Vacuum method for creation of liquid crystal orienting microrelief / Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2003. — Т. 6, № 4. — С. 528-532. — Бібліогр.: 16 назв. — англ. 1560-8034 PACS: 42.79.Kr https://nasplib.isofts.kiev.ua/handle/123456789/118102 A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated. en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics Vacuum method for creation of liquid crystal orienting microrelief Article published earlier |
| spellingShingle | Vacuum method for creation of liquid crystal orienting microrelief Kolomzarov, Yu. Oleksenko, P. Sorokin, V. Tytarenko, P. Zelinskyy, R. |
| title | Vacuum method for creation of liquid crystal orienting microrelief |
| title_full | Vacuum method for creation of liquid crystal orienting microrelief |
| title_fullStr | Vacuum method for creation of liquid crystal orienting microrelief |
| title_full_unstemmed | Vacuum method for creation of liquid crystal orienting microrelief |
| title_short | Vacuum method for creation of liquid crystal orienting microrelief |
| title_sort | vacuum method for creation of liquid crystal orienting microrelief |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/118102 |
| work_keys_str_mv | AT kolomzarovyu vacuummethodforcreationofliquidcrystalorientingmicrorelief AT oleksenkop vacuummethodforcreationofliquidcrystalorientingmicrorelief AT sorokinv vacuummethodforcreationofliquidcrystalorientingmicrorelief AT tytarenkop vacuummethodforcreationofliquidcrystalorientingmicrorelief AT zelinskyyr vacuummethodforcreationofliquidcrystalorientingmicrorelief |