Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅

Ge₃₃As₁₂Se₅₅-Si(n) heterostructures with modified by bismuth atoms transition layer were obtained by the discrete thermal evaporation method. Described are formation and investigation methods for these heterostructures. The mechanism of charge transmission in this heterostructures was ascertained. I...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2004
Hauptverfasser: Kondrat, O., Popovich, N., Dovgoshej, N.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2004
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118107
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅ / O. Kondrat, N. Popovich, N. Dovgoshej // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 56-59. — Бібліогр.: 13 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118107
record_format dspace
spelling Kondrat, O.
Popovich, N.
Dovgoshej, N.
2017-05-28T17:29:43Z
2017-05-28T17:29:43Z
2004
Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅ / O. Kondrat, N. Popovich, N. Dovgoshej // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 56-59. — Бібліогр.: 13 назв. — англ.
1560-8034
PACS: 73.40.-c
https://nasplib.isofts.kiev.ua/handle/123456789/118107
Ge₃₃As₁₂Se₅₅-Si(n) heterostructures with modified by bismuth atoms transition layer were obtained by the discrete thermal evaporation method. Described are formation and investigation methods for these heterostructures. The mechanism of charge transmission in this heterostructures was ascertained. It is illustrated that the barrier for holes at the boundary is absent. The energy diagram of the heterostructure was built. Analyzed is the absence of a soft breakdown, which is caused by the electrons transfer through interstices when the negative voltage is applied. The dependence of heterostructure electrophysical properties on Ge₃₃As₁₂Se₅₅ film thickness was investigated. It is shown that in heterostructures with a modified transition layer ther is a necessity to use Ge₃₃As₁₂Se₅₅ film with the thickness more than 0.4 mm. It is ascertained that at the modification of the transition layer the conversion from the sharp to smooth transition takes place, which is caused by diffusion of bismuth atoms to surface layers.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
spellingShingle Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
Kondrat, O.
Popovich, N.
Dovgoshej, N.
title_short Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
title_full Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
title_fullStr Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
title_full_unstemmed Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅
title_sort charge transition phenomena in the heterostructure crystalline si-bi-amorphous film ge₃₃as₁₂se₅₅
author Kondrat, O.
Popovich, N.
Dovgoshej, N.
author_facet Kondrat, O.
Popovich, N.
Dovgoshej, N.
publishDate 2004
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description Ge₃₃As₁₂Se₅₅-Si(n) heterostructures with modified by bismuth atoms transition layer were obtained by the discrete thermal evaporation method. Described are formation and investigation methods for these heterostructures. The mechanism of charge transmission in this heterostructures was ascertained. It is illustrated that the barrier for holes at the boundary is absent. The energy diagram of the heterostructure was built. Analyzed is the absence of a soft breakdown, which is caused by the electrons transfer through interstices when the negative voltage is applied. The dependence of heterostructure electrophysical properties on Ge₃₃As₁₂Se₅₅ film thickness was investigated. It is shown that in heterostructures with a modified transition layer ther is a necessity to use Ge₃₃As₁₂Se₅₅ film with the thickness more than 0.4 mm. It is ascertained that at the modification of the transition layer the conversion from the sharp to smooth transition takes place, which is caused by diffusion of bismuth atoms to surface layers.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118107
citation_txt Charge transition phenomena in the heterostructure crystalline Si-Bi-amorphous film Ge₃₃As₁₂Se₅₅ / O. Kondrat, N. Popovich, N. Dovgoshej // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2004. — Т. 7, № 1. — С. 56-59. — Бібліогр.: 13 назв. — англ.
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AT dovgoshejn chargetransitionphenomenaintheheterostructurecrystallinesibiamorphousfilmge33as12se55
first_indexed 2025-12-07T17:16:34Z
last_indexed 2025-12-07T17:16:34Z
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