A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs

In this study, we look at the advantages of (111) GaAs substrate over (001) one, when used to grow Hall devices by MBE. In top of that, we explore the consequence of a modified design of modulation doping pseudomorphic AlGaAs/InGaAs/GaAs, and we suggest a new quantum well structure for a Hall dev...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2012
Hauptverfasser: Sghaier, H., Bouzaiene, L., Sfaxi, L., Maaref, H.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118246
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs / H. Sghaier, L. Bouzaiene, L. Sfaxi, H. Maaref // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 72-76. — Бібліогр.: 18 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118246
record_format dspace
spelling Sghaier, H.
Bouzaiene, L.
Sfaxi, L.
Maaref, H.
2017-05-29T13:55:52Z
2017-05-29T13:55:52Z
2012
A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs / H. Sghaier, L. Bouzaiene, L. Sfaxi, H. Maaref // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 72-76. — Бібліогр.: 18 назв. — англ.
1560-8034
PACS 53.50.Td, 71.76, 72.80.Ey, 85.30.De, 85.30.Fg
https://nasplib.isofts.kiev.ua/handle/123456789/118246
In this study, we look at the advantages of (111) GaAs substrate over (001) one, when used to grow Hall devices by MBE. In top of that, we explore the consequence of a modified design of modulation doping pseudomorphic AlGaAs/InGaAs/GaAs, and we suggest a new quantum well structure for a Hall device grown on (111) GaAs substrate, with the objective of improving its performances. From self-consistent calculations, we find that the electron concentration ns in the interface region is enhanced. This implies that one can have a wider spacer layer and still have the same ns with the result that the mobility is improved. This result should be valuable for many types of devices. We specifically consider Hall sensors, where it is desirable to have a low electron concentration and high mobility.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
spellingShingle A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
Sghaier, H.
Bouzaiene, L.
Sfaxi, L.
Maaref, H.
title_short A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
title_full A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
title_fullStr A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
title_full_unstemmed A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs
title_sort novel al₀.₃₃ga₀.₆₇as/in₀.₁₅ga₀.₈₅as/gaas quantum well hall device grown on (111) gaas
author Sghaier, H.
Bouzaiene, L.
Sfaxi, L.
Maaref, H.
author_facet Sghaier, H.
Bouzaiene, L.
Sfaxi, L.
Maaref, H.
publishDate 2012
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description In this study, we look at the advantages of (111) GaAs substrate over (001) one, when used to grow Hall devices by MBE. In top of that, we explore the consequence of a modified design of modulation doping pseudomorphic AlGaAs/InGaAs/GaAs, and we suggest a new quantum well structure for a Hall device grown on (111) GaAs substrate, with the objective of improving its performances. From self-consistent calculations, we find that the electron concentration ns in the interface region is enhanced. This implies that one can have a wider spacer layer and still have the same ns with the result that the mobility is improved. This result should be valuable for many types of devices. We specifically consider Hall sensors, where it is desirable to have a low electron concentration and high mobility.
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118246
citation_txt A novel Al₀.₃₃Ga₀.₆₇As/In₀.₁₅Ga₀.₈₅As/GaAs quantum well Hall device grown on (111) GaAs / H. Sghaier, L. Bouzaiene, L. Sfaxi, H. Maaref // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 72-76. — Бібліогр.: 18 назв. — англ.
work_keys_str_mv AT sghaierh anovelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT bouzaienel anovelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT sfaxil anovelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT maarefh anovelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT sghaierh novelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT bouzaienel novelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT sfaxil novelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
AT maarefh novelal033ga067asin015ga085asgaasquantumwellhalldevicegrownon111gaas
first_indexed 2025-12-07T13:17:03Z
last_indexed 2025-12-07T13:17:03Z
_version_ 1850855572842217472