Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films

In this work, we studied comparative characteristics of the SiO₂/SiC heterostructures. The following two techniques were used for SiO₂ formation: thermal oxidation in water vapor (i) and oxidation in solution (ii). According to experimental results obtained from optical absorption and photolumine...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2012
Hauptverfasser: Bacherikov, Yu.Yu., Boltovets, N.S., Konakova, R.V., Kolyadina, E.Yu., Ledn’ova, T.M., Okhrimenko, O.B.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118258
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films / Yu.Yu. Bacherikov, N.S. Boltovets, R.V. Konakova, E.Yu. Kolyadina, T.M. Ledn'ova, O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 13-16. — Бібліогр.: 18 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118258
record_format dspace
spelling Bacherikov, Yu.Yu.
Boltovets, N.S.
Konakova, R.V.
Kolyadina, E.Yu.
Ledn’ova, T.M.
Okhrimenko, O.B.
2017-05-29T14:13:16Z
2017-05-29T14:13:16Z
2012
Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films / Yu.Yu. Bacherikov, N.S. Boltovets, R.V. Konakova, E.Yu. Kolyadina, T.M. Ledn'ova, O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 13-16. — Бібліогр.: 18 назв. — англ.
1560-8034
PACS 07.10.Lw, 81.10.Bk, Dn, 77.84.Bw, 78.40, 78.55, 81.16.Pr
https://nasplib.isofts.kiev.ua/handle/123456789/118258
In this work, we studied comparative characteristics of the SiO₂/SiC heterostructures. The following two techniques were used for SiO₂ formation: thermal oxidation in water vapor (i) and oxidation in solution (ii). According to experimental results obtained from optical absorption and photoluminescence spectra as well as from measurements of internal mechanical stresses, one can conclude that the thin SiO₂ films prepared using the technique (ii) possess SiO₂/SiC interface with a less number of defective states than that for SiO₂ films prepared using the technique (i).
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
spellingShingle Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
Bacherikov, Yu.Yu.
Boltovets, N.S.
Konakova, R.V.
Kolyadina, E.Yu.
Ledn’ova, T.M.
Okhrimenko, O.B.
title_short Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
title_full Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
title_fullStr Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
title_full_unstemmed Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films
title_sort interface features of sio₂/sic heterostructures according to methods for producing the sio₂ thin films
author Bacherikov, Yu.Yu.
Boltovets, N.S.
Konakova, R.V.
Kolyadina, E.Yu.
Ledn’ova, T.M.
Okhrimenko, O.B.
author_facet Bacherikov, Yu.Yu.
Boltovets, N.S.
Konakova, R.V.
Kolyadina, E.Yu.
Ledn’ova, T.M.
Okhrimenko, O.B.
publishDate 2012
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description In this work, we studied comparative characteristics of the SiO₂/SiC heterostructures. The following two techniques were used for SiO₂ formation: thermal oxidation in water vapor (i) and oxidation in solution (ii). According to experimental results obtained from optical absorption and photoluminescence spectra as well as from measurements of internal mechanical stresses, one can conclude that the thin SiO₂ films prepared using the technique (ii) possess SiO₂/SiC interface with a less number of defective states than that for SiO₂ films prepared using the technique (i).
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118258
citation_txt Interface features of SiO₂/SiC heterostructures according to methods for producing the SiO₂ thin films / Yu.Yu. Bacherikov, N.S. Boltovets, R.V. Konakova, E.Yu. Kolyadina, T.M. Ledn'ova, O.B. Okhrimenko // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 1. — С. 13-16. — Бібліогр.: 18 назв. — англ.
work_keys_str_mv AT bacherikovyuyu interfacefeaturesofsio2sicheterostructuresaccordingtomethodsforproducingthesio2thinfilms
AT boltovetsns interfacefeaturesofsio2sicheterostructuresaccordingtomethodsforproducingthesio2thinfilms
AT konakovarv interfacefeaturesofsio2sicheterostructuresaccordingtomethodsforproducingthesio2thinfilms
AT kolyadinaeyu interfacefeaturesofsio2sicheterostructuresaccordingtomethodsforproducingthesio2thinfilms
AT lednovatm interfacefeaturesofsio2sicheterostructuresaccordingtomethodsforproducingthesio2thinfilms
AT okhrimenkoob interfacefeaturesofsio2sicheterostructuresaccordingtomethodsforproducingthesio2thinfilms
first_indexed 2025-12-07T13:29:34Z
last_indexed 2025-12-07T13:29:34Z
_version_ 1850856360472739840