Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures

We investigated the effect of hydrostatic pressure on relaxation characteristics
 of the three-layer Al-SiO₂-n-Si<Ni> structures. It was found that 20 min
 exposure to a pressure of 8 kbars results in reduction of the integral density of surface
 states, while exer...

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Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2012
Hauptverfasser: Vlasov, S.I., Ovsyannikov, A.V., Ismailov, B.K., Kuchkarov, B.H.
Format: Artikel
Sprache:Englisch
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118305
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Zitieren:Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures / S.I. Vlasov, A.V. Ovsyannikov, B.K. Ismailov, B.H. Kuchkarov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 2. — С. 166-169. — Бібліогр.: 15Х назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Vlasov, S.I.
Ovsyannikov, A.V.
Ismailov, B.K.
Kuchkarov, B.H.
author_facet Vlasov, S.I.
Ovsyannikov, A.V.
Ismailov, B.K.
Kuchkarov, B.H.
citation_txt Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures / S.I. Vlasov, A.V. Ovsyannikov, B.K. Ismailov, B.H. Kuchkarov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 2. — С. 166-169. — Бібліогр.: 15Х назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description We investigated the effect of hydrostatic pressure on relaxation characteristics
 of the three-layer Al-SiO₂-n-Si<Ni> structures. It was found that 20 min
 exposure to a pressure of 8 kbars results in reduction of the integral density of surface
 states, while exerting no influence on the generation centers in the bulk.
first_indexed 2025-11-25T04:24:24Z
format Article
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id nasplib_isofts_kiev_ua-123456789-118305
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
issn 1560-8034
language English
last_indexed 2025-11-25T04:24:24Z
publishDate 2012
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Vlasov, S.I.
Ovsyannikov, A.V.
Ismailov, B.K.
Kuchkarov, B.H.
2017-05-29T16:39:22Z
2017-05-29T16:39:22Z
2012
Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures / S.I. Vlasov, A.V. Ovsyannikov, B.K. Ismailov, B.H. Kuchkarov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 2. — С. 166-169. — Бібліогр.: 15Х назв. — англ.
1560-8034
PACS 73.40.Rw
https://nasplib.isofts.kiev.ua/handle/123456789/118305
We investigated the effect of hydrostatic pressure on relaxation characteristics
 of the three-layer Al-SiO₂-n-Si<Ni> structures. It was found that 20 min
 exposure to a pressure of 8 kbars results in reduction of the integral density of surface
 states, while exerting no influence on the generation centers in the bulk.
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
Article
published earlier
spellingShingle Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
Vlasov, S.I.
Ovsyannikov, A.V.
Ismailov, B.K.
Kuchkarov, B.H.
title Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
title_full Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
title_fullStr Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
title_full_unstemmed Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
title_short Effect of pressure on the properties of Al-SiO₂-n-Si<Ni> structures
title_sort effect of pressure on the properties of al-sio₂-n-si<ni> structures
url https://nasplib.isofts.kiev.ua/handle/123456789/118305
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