HgCdTe quantum wells grown by molecular beam epitaxy

CdxHg₁₋xTe-based (x = 0 – 0.25) quantum wells (QWs) of 8 – 22 nm in
 thickness were grown on (013) CdTe/ZnTe/GaAs substrates by molecular beam epitaxy.
 The composition and thickness (d) of wide-gap layers (spacers) were x ∼ 0.7 mol.frac.
 and d ∼ 35 nm, respectively, at both...

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Published in:Semiconductor Physics Quantum Electronics & Optoelectronics
Date:2007
Main Authors: Dvoretsky, S.A, Ikusov, D.G., Kvon, Z.D., Mikhailov, N.N., Remesnik, V.G., Smirnov, R.N., Sidorov, Yu.G., Shvets, V.A.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Online Access:https://nasplib.isofts.kiev.ua/handle/123456789/118333
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Cite this:HgCdTe quantum wells grown by molecular beam epitaxy / S.A.Dvoretsky, D.G.Ikusov. Z.D.Kvon, N.N.Mikhailov, V.G.Remesnik, R.N.Smirnov, Yu.G.Sidorov, V.A.Shvets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 47-53. — Бібліогр.: 25 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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author Dvoretsky, S.A
Ikusov, D.G.
Kvon, Z.D.
Mikhailov, N.N.
Remesnik, V.G.
Smirnov, R.N.
Sidorov, Yu.G.
Shvets, V.A.
author_facet Dvoretsky, S.A
Ikusov, D.G.
Kvon, Z.D.
Mikhailov, N.N.
Remesnik, V.G.
Smirnov, R.N.
Sidorov, Yu.G.
Shvets, V.A.
citation_txt HgCdTe quantum wells grown by molecular beam epitaxy / S.A.Dvoretsky, D.G.Ikusov. Z.D.Kvon, N.N.Mikhailov, V.G.Remesnik, R.N.Smirnov, Yu.G.Sidorov, V.A.Shvets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 47-53. — Бібліогр.: 25 назв. — англ.
collection DSpace DC
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
description CdxHg₁₋xTe-based (x = 0 – 0.25) quantum wells (QWs) of 8 – 22 nm in
 thickness were grown on (013) CdTe/ZnTe/GaAs substrates by molecular beam epitaxy.
 The composition and thickness (d) of wide-gap layers (spacers) were x ∼ 0.7 mol.frac.
 and d ∼ 35 nm, respectively, at both sides of the quantum well. The thickness and
 composition of epilayers during the growth were controlled by ellipsometry in situ. It
 was shown that the accuracy of thickness and composition were ∆x = ± 0.002, ∆d =
 ± 0.5 nm. The central part of spacers (10 nm thick) was doped by indium up to a carrier
 concentration of ∼10¹⁵ cm⁻³
 . A CdTe cap layer 40 nm in thickness was grown to protect
 QW. The compositions of the spacer and QWs were determined by measuring the Е₁ and
 Е₁+∆₁ peaks in reflection spectra using layer-by-layer chemical etching. The galvanomagnetic
 investigations (the range of magnetic fields was 0 – 13 T) of the grown QW
 showed the presence of a 2D electron gas in all the samples. The 2D electron mobility
 µe = (2.4 – 3.5)×10⁵
 cm²
 /(V·s) for the concentrations N = (1.5 – 3)×10¹¹ cm⁻² (x < 0.11)
 that confirms a high quality of the grown QWs.
first_indexed 2025-11-30T16:33:47Z
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institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
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language English
last_indexed 2025-11-30T16:33:47Z
publishDate 2007
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
record_format dspace
spelling Dvoretsky, S.A
Ikusov, D.G.
Kvon, Z.D.
Mikhailov, N.N.
Remesnik, V.G.
Smirnov, R.N.
Sidorov, Yu.G.
Shvets, V.A.
2017-05-29T19:19:45Z
2017-05-29T19:19:45Z
2007
HgCdTe quantum wells grown by molecular beam epitaxy / S.A.Dvoretsky, D.G.Ikusov. Z.D.Kvon, N.N.Mikhailov, V.G.Remesnik, R.N.Smirnov, Yu.G.Sidorov, V.A.Shvets // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 47-53. — Бібліогр.: 25 назв. — англ.
1560-8034
PACS 07.60.Fs, 73.43.-f, 75.75.+q, 78.30.Fs, 81.05.Dz, 81.15.Hi
https://nasplib.isofts.kiev.ua/handle/123456789/118333
CdxHg₁₋xTe-based (x = 0 – 0.25) quantum wells (QWs) of 8 – 22 nm in
 thickness were grown on (013) CdTe/ZnTe/GaAs substrates by molecular beam epitaxy.
 The composition and thickness (d) of wide-gap layers (spacers) were x ∼ 0.7 mol.frac.
 and d ∼ 35 nm, respectively, at both sides of the quantum well. The thickness and
 composition of epilayers during the growth were controlled by ellipsometry in situ. It
 was shown that the accuracy of thickness and composition were ∆x = ± 0.002, ∆d =
 ± 0.5 nm. The central part of spacers (10 nm thick) was doped by indium up to a carrier
 concentration of ∼10¹⁵ cm⁻³
 . A CdTe cap layer 40 nm in thickness was grown to protect
 QW. The compositions of the spacer and QWs were determined by measuring the Е₁ and
 Е₁+∆₁ peaks in reflection spectra using layer-by-layer chemical etching. The galvanomagnetic
 investigations (the range of magnetic fields was 0 – 13 T) of the grown QW
 showed the presence of a 2D electron gas in all the samples. The 2D electron mobility
 µe = (2.4 – 3.5)×10⁵
 cm²
 /(V·s) for the concentrations N = (1.5 – 3)×10¹¹ cm⁻² (x < 0.11)
 that confirms a high quality of the grown QWs.
The work is partially supported by a complex integration
 project of SB RAS N 3.20.
 The authors are very grateful to L.D. Burdina for
 carrying out the GaAs substrate preparation and
 chemical layer-by-layer etching, V.A. Kartashov and
 I.N. Uzhakov for the growth of buffer layers, and
 T.I. Zakharyash for the fabricaton of Hall structures
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
HgCdTe quantum wells grown by molecular beam epitaxy
Article
published earlier
spellingShingle HgCdTe quantum wells grown by molecular beam epitaxy
Dvoretsky, S.A
Ikusov, D.G.
Kvon, Z.D.
Mikhailov, N.N.
Remesnik, V.G.
Smirnov, R.N.
Sidorov, Yu.G.
Shvets, V.A.
title HgCdTe quantum wells grown by molecular beam epitaxy
title_full HgCdTe quantum wells grown by molecular beam epitaxy
title_fullStr HgCdTe quantum wells grown by molecular beam epitaxy
title_full_unstemmed HgCdTe quantum wells grown by molecular beam epitaxy
title_short HgCdTe quantum wells grown by molecular beam epitaxy
title_sort hgcdte quantum wells grown by molecular beam epitaxy
url https://nasplib.isofts.kiev.ua/handle/123456789/118333
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