Development of high-stable contact systems to gallium nitride microwave diodes

High-stable heat-resistant low-resistance contact systems with diffusion barriers involving quasi-amorphous TiBx layers are suggested and studied. We have performed the structural and morphological investigations along with studies of Auger concentration depth profiles in the contacts both bef...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Semiconductor Physics Quantum Electronics & Optoelectronics
Datum:2007
Hauptverfasser: Belyaev, A.E., Boltovets, N.S., Ivanov, V.N., Kapitanchuk, L.M., Kladko, V.P., Konakova, R.V., Kudryk, Ya.Ya., Kuchuk, A.V., Lytvyn, O.S., Milenin, V.V., Sheremet, V.N., Sveshnikov, Yu.N.
Format: Artikel
Sprache:English
Veröffentlicht: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2007
Online Zugang:https://nasplib.isofts.kiev.ua/handle/123456789/118341
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Development of high-stable contact systems to gallium nitride microwave diodes / A.E. Belyaev, N.S. Boltovets, V.N. Ivanov, L.M. Kapitanchuk, V.P. Kladko, R.V. Konakova, Ya.Ya. Kudryk, A.V. Kuchuk, O.S. Lytvyn, V.V. Milenin, V.N. Sheremet, Yu.N. Sveshnikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 1-8. — Бібліогр.: 20 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
id nasplib_isofts_kiev_ua-123456789-118341
record_format dspace
spelling Belyaev, A.E.
Boltovets, N.S.
Ivanov, V.N.
Kapitanchuk, L.M.
Kladko, V.P.
Konakova, R.V.
Kudryk, Ya.Ya.
Kuchuk, A.V.
Lytvyn, O.S.
Milenin, V.V.
Sheremet, V.N.
Sveshnikov, Yu.N.
2017-05-29T19:36:26Z
2017-05-29T19:36:26Z
2007
Development of high-stable contact systems to gallium nitride microwave diodes / A.E. Belyaev, N.S. Boltovets, V.N. Ivanov, L.M. Kapitanchuk, V.P. Kladko, R.V. Konakova, Ya.Ya. Kudryk, A.V. Kuchuk, O.S. Lytvyn, V.V. Milenin, V.N. Sheremet, Yu.N. Sveshnikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 1-8. — Бібліогр.: 20 назв. — англ.
1560-8034
PACS 85.40.Ls
https://nasplib.isofts.kiev.ua/handle/123456789/118341
High-stable heat-resistant low-resistance contact systems with diffusion barriers involving quasi-amorphous TiBx layers are suggested and studied. We have performed the structural and morphological investigations along with studies of Auger concentration depth profiles in the contacts both before and after rapid thermal annealing. It is found that the Au−TiBx−Al−Ti−GaN contact layers with diffusion barriers retain both a layered structure of the contact metallization and the value of contact resistivity practically unchanged up to the temperature Т ≈ 700 ºС. At the same time, the layered structure of the metallization in standard Au−Ti−Al−Ti−GaN contact systems breaks down at such rapid thermal annealing. It is shown that the contact metallization of both types demonstrates the tunnel current flow mechanism in the temperature range 225−335 K, whereas the current flow mechanism is thermionic in the range 335−380 K, the Schottky barrier height being ~0.16 eV. For the best samples under consideration, the contact resistivity was no more than 10⁻⁶ Ohm∙cm² .
en
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
Semiconductor Physics Quantum Electronics & Optoelectronics
Development of high-stable contact systems to gallium nitride microwave diodes
Article
published earlier
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
title Development of high-stable contact systems to gallium nitride microwave diodes
spellingShingle Development of high-stable contact systems to gallium nitride microwave diodes
Belyaev, A.E.
Boltovets, N.S.
Ivanov, V.N.
Kapitanchuk, L.M.
Kladko, V.P.
Konakova, R.V.
Kudryk, Ya.Ya.
Kuchuk, A.V.
Lytvyn, O.S.
Milenin, V.V.
Sheremet, V.N.
Sveshnikov, Yu.N.
title_short Development of high-stable contact systems to gallium nitride microwave diodes
title_full Development of high-stable contact systems to gallium nitride microwave diodes
title_fullStr Development of high-stable contact systems to gallium nitride microwave diodes
title_full_unstemmed Development of high-stable contact systems to gallium nitride microwave diodes
title_sort development of high-stable contact systems to gallium nitride microwave diodes
author Belyaev, A.E.
Boltovets, N.S.
Ivanov, V.N.
Kapitanchuk, L.M.
Kladko, V.P.
Konakova, R.V.
Kudryk, Ya.Ya.
Kuchuk, A.V.
Lytvyn, O.S.
Milenin, V.V.
Sheremet, V.N.
Sveshnikov, Yu.N.
author_facet Belyaev, A.E.
Boltovets, N.S.
Ivanov, V.N.
Kapitanchuk, L.M.
Kladko, V.P.
Konakova, R.V.
Kudryk, Ya.Ya.
Kuchuk, A.V.
Lytvyn, O.S.
Milenin, V.V.
Sheremet, V.N.
Sveshnikov, Yu.N.
publishDate 2007
language English
container_title Semiconductor Physics Quantum Electronics & Optoelectronics
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
format Article
description High-stable heat-resistant low-resistance contact systems with diffusion barriers involving quasi-amorphous TiBx layers are suggested and studied. We have performed the structural and morphological investigations along with studies of Auger concentration depth profiles in the contacts both before and after rapid thermal annealing. It is found that the Au−TiBx−Al−Ti−GaN contact layers with diffusion barriers retain both a layered structure of the contact metallization and the value of contact resistivity practically unchanged up to the temperature Т ≈ 700 ºС. At the same time, the layered structure of the metallization in standard Au−Ti−Al−Ti−GaN contact systems breaks down at such rapid thermal annealing. It is shown that the contact metallization of both types demonstrates the tunnel current flow mechanism in the temperature range 225−335 K, whereas the current flow mechanism is thermionic in the range 335−380 K, the Schottky barrier height being ~0.16 eV. For the best samples under consideration, the contact resistivity was no more than 10⁻⁶ Ohm∙cm² .
issn 1560-8034
url https://nasplib.isofts.kiev.ua/handle/123456789/118341
citation_txt Development of high-stable contact systems to gallium nitride microwave diodes / A.E. Belyaev, N.S. Boltovets, V.N. Ivanov, L.M. Kapitanchuk, V.P. Kladko, R.V. Konakova, Ya.Ya. Kudryk, A.V. Kuchuk, O.S. Lytvyn, V.V. Milenin, V.N. Sheremet, Yu.N. Sveshnikov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2007. — Т. 10, № 4. — С. 1-8. — Бібліогр.: 20 назв. — англ.
work_keys_str_mv AT belyaevae developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT boltovetsns developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT ivanovvn developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT kapitanchuklm developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT kladkovp developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT konakovarv developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT kudrykyaya developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT kuchukav developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT lytvynos developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT mileninvv developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT sheremetvn developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
AT sveshnikovyun developmentofhighstablecontactsystemstogalliumnitridemicrowavediodes
first_indexed 2025-12-07T13:35:18Z
last_indexed 2025-12-07T13:35:18Z
_version_ 1850856721095852032