High-density data recording via laser thermo-lithography and ion-beam etching
Pits 250 – 300 - nm wide were obtained on the surface of thin organic
 nanocomposite film using master-disc laser-burning station with 405 nm laser beam
 focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent
 reactive ion-beam etching of glass...
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| Veröffentlicht in: | Semiconductor Physics Quantum Electronics & Optoelectronics |
|---|---|
| Datum: | 2014 |
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | Englisch |
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Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2014
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| Online Zugang: | https://nasplib.isofts.kiev.ua/handle/123456789/118350 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | High-density data recording via laser thermo-lithography
 and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| _version_ | 1862543759639576576 |
|---|---|
| author | Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. |
| author_facet | Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. |
| citation_txt | High-density data recording via laser thermo-lithography
 and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ. |
| collection | DSpace DC |
| container_title | Semiconductor Physics Quantum Electronics & Optoelectronics |
| description | Pits 250 – 300 - nm wide were obtained on the surface of thin organic
nanocomposite film using master-disc laser-burning station with 405 nm laser beam
focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent
reactive ion-beam etching of glass substrate. Finally, 150 – 200-nm pits were performed
on the substrate surface. Nanocomposite films were based on organic positive photoresist
with a dye inclusions. This dye is characterized by wide absorption band within the
spectral region 390–410 nm and can be evaporated by laser irradiation with the
wavelength 405 nm
|
| first_indexed | 2025-11-24T23:40:21Z |
| format | Article |
| fulltext | |
| id | nasplib_isofts_kiev_ua-123456789-118350 |
| institution | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| issn | 1560-8034 |
| language | English |
| last_indexed | 2025-11-24T23:40:21Z |
| publishDate | 2014 |
| publisher | Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| record_format | dspace |
| spelling | Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. 2017-05-30T05:33:14Z 2017-05-30T05:33:14Z 2014 High-density data recording via laser thermo-lithography
 and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ. 1560-8034 PACS 81.16.Nd https://nasplib.isofts.kiev.ua/handle/123456789/118350 Pits 250 – 300 - nm wide were obtained on the surface of thin organic
 nanocomposite film using master-disc laser-burning station with 405 nm laser beam
 focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent
 reactive ion-beam etching of glass substrate. Finally, 150 – 200-nm pits were performed
 on the substrate surface. Nanocomposite films were based on organic positive photoresist
 with a dye inclusions. This dye is characterized by wide absorption band within the
 spectral region 390–410 nm and can be evaporated by laser irradiation with the
 wavelength 405 nm en Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України Semiconductor Physics Quantum Electronics & Optoelectronics High-density data recording via laser thermo-lithography and ion-beam etching Article published earlier |
| spellingShingle | High-density data recording via laser thermo-lithography and ion-beam etching Gorbov, I.V. Kryuchyn, A.A. Grytsenko, K.P. Manko, D.Yu. Borodin, Yu.O. |
| title | High-density data recording via laser thermo-lithography and ion-beam etching |
| title_full | High-density data recording via laser thermo-lithography and ion-beam etching |
| title_fullStr | High-density data recording via laser thermo-lithography and ion-beam etching |
| title_full_unstemmed | High-density data recording via laser thermo-lithography and ion-beam etching |
| title_short | High-density data recording via laser thermo-lithography and ion-beam etching |
| title_sort | high-density data recording via laser thermo-lithography and ion-beam etching |
| url | https://nasplib.isofts.kiev.ua/handle/123456789/118350 |
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