High-density data recording via laser thermo-lithography and ion-beam etching

• Published in: Semiconductor Physics Quantum Electronics & Optoelectronics
• Date: 2014
• Main Authors: Gorbov, I.V., Kryuchyn, A.A., Grytsenko, K.P., Manko, D.Yu., Borodin, Yu.O.
• Format: Article
• Language: English
• Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2014
• Online Access: https://nasplib.isofts.kiev.ua/handle/123456789/118350
• Journal Title: Digital Library of Periodicals of National Academy of Sciences of Ukraine
• Cite this: High-density data recording via laser thermo-lithography and ion-beam etching / I.V. Gorbov, A.A. Kryuchyn, K.P. Grytsenko, D.Yu. Manko, Yu.O. Borodin // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2014. — Т. 17, № 1. — С. 52-55. — Бібліогр.: 7 назв. — англ.

Pits 250 – 300 - nm wide were obtained on the surface of thin organic nanocomposite film using master-disc laser-burning station with 405 nm laser beam focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent reactive ion-beam etching of glass substrate. Finally, 150...